Chin. Phys. B
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Chin. Phys. B  2016, Vol. 25 Issue (7): 075202    DOI: 10.1088/1674-1056/25/7/075202
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Current Issue| Next Issue| Archive| Adv Search |
Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering
Ming-Wei Gao(高明伟)1, Chao Ye(叶超)1,2, Xiang-Ying Wang(王响英)3, Yi-Song He(何一松)1, Jia-Min Guo(郭佳敏)1, Pei-Fang Yang(杨培芳)1
1 College of Physics, Optoelectronics and Energy, Soochow University, Suzhou 215006, China;
2 Key Laboratory of Thin Films of Jiangsu Province, Soochow University, Suzhou 215006, China;
3 Medical College, Soochow University, Suzhou 215123, China

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