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Chin. Phys. B, 2017, Vol. 26(9): 095204    DOI: 10.1088/1674-1056/26/9/095204
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Prev   Next  

Understanding hydrogen plasma processes based on the diagnostic results of 2.45 GHz ECRIS at Peking University

Wen-Bin Wu(武文斌)1, Hai-Tao Ren(任海涛)1, Shi-Xiang Peng(彭士香)1, Yuan Xu(徐源)1, Jia-Mei Wen(温佳美)1, Jiang Sun(孙江)1, Ai-Lin Zhang(张艾霖)1,2, Tao Zhang(张滔)1, Jing-Feng Zhang(张景丰)1, Jia-Er Chen(陈佳洱)1,2
1 SKLNPTT&IHIP, School of Physics, Peking University, Beijing 100871, China;
2 University of Chinese Academy of Sciences, Beijing 100049, China
Abstract  Optical emission spectroscopy (OES), as a simple in situ method without disturbing the plasma, has been performed for the plasma diagnosis of a 2.45 GHz permanent magnet electron cyclotron resonance (PMECR) ion source at Peking University (PKU). A spectrum measurement platform has been set up with the quartz-chamber electron cyclotron resonance (ECR) ion source [Patent Number: ZL 201110026605.4] and experiments were carried out recently. The electron temperature and electron density inside the ECR plasma chamber have been measured with the method of line intensity ratio of noble gas. Hydrogen plasma processes inside the discharge chamber are discussed based on the diagnostic results. What is more, the superiority of the method of line intensity ratio of noble gas is indicated with a comparison to line intensity ratio of hydrogen. Details will be presented in this paper.
Keywords:  electron cyclotron resonance (ECR) ion source      hydrogen plasma      plasma diagnosis      optical emission spectroscopy  
Received:  24 February 2017      Revised:  19 May 2017      Accepted manuscript online: 
PACS:  52.50.Sw (Plasma heating by microwaves; ECR, LH, collisional heating)  
  52.50.Dg (Plasma sources)  
  52.70.-m (Plasma diagnostic techniques and instrumentation)  
  52.70.Kz (Optical (ultraviolet, visible, infrared) measurements)  
Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 11175009 and 11575013).
Corresponding Authors:  Hai-Tao Ren     E-mail:  htren@pku.edu.cn

Cite this article: 

Wen-Bin Wu(武文斌), Hai-Tao Ren(任海涛), Shi-Xiang Peng(彭士香), Yuan Xu(徐源), Jia-Mei Wen(温佳美), Jiang Sun(孙江), Ai-Lin Zhang(张艾霖), Tao Zhang(张滔), Jing-Feng Zhang(张景丰), Jia-Er Chen(陈佳洱) Understanding hydrogen plasma processes based on the diagnostic results of 2.45 GHz ECRIS at Peking University 2017 Chin. Phys. B 26 095204

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