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Chin. Phys. B, 2016, Vol. 25(7): 075202    DOI: 10.1088/1674-1056/25/7/075202

Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering

Ming-Wei Gao(高明伟)1, Chao Ye(叶超)1,2, Xiang-Ying Wang(王响英)3, Yi-Song He(何一松)1, Jia-Min Guo(郭佳敏)1, Pei-Fang Yang(杨培芳)1
1 College of Physics, Optoelectronics and Energy, Soochow University, Suzhou 215006, China;
2 Key Laboratory of Thin Films of Jiangsu Province, Soochow University, Suzhou 215006, China;
3 Medical College, Soochow University, Suzhou 215123, China
Abstract  Growth and structural properties of thin a-C films prepared by the 60 MHz very-high-frequency (VHF) magnetron sputtering were investigated. The energy and flux of ions impinging the substrate were also analyzed. It is found that the thin a-C films prepared by the 60 MHz sputtering have a lower growth rate, a smooth surface, and more sp3 contents. These features are related to the higher ion energy and the lower ions flux onto the substrate. Therefore, the 60 MHz VHF sputtering is more suitable for the preparation of thin a-C film with more sp3 contents.
Keywords:  carbon thin films      very-high-frequency sputtering      structural properties  
Received:  25 January 2016      Revised:  07 March 2016      Published:  05 July 2016
PACS:  52.80.Pi (High-frequency and RF discharges)  
  81.15.Cd (Deposition by sputtering)  
  68.55.-a (Thin film structure and morphology)  
Fund: Project supported by the National Natural Science Foundation of China (Grant No. 11275136).
Corresponding Authors:  Chao Ye     E-mail:

Cite this article: 

Ming-Wei Gao(高明伟), Chao Ye(叶超), Xiang-Ying Wang(王响英), Yi-Song He(何一松), Jia-Min Guo(郭佳敏), Pei-Fang Yang(杨培芳) Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering 2016 Chin. Phys. B 25 075202

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