The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling
Fang Liang(方亮)a), Du Jing-Lei(杜惊雷)a)†, Guo Xiao-Wei(郭小伟)a), Wang Jing-Quan(王景全)a), Zhang Zhi-You(张志友)a), Luo Xian-Gang(罗先刚)b), and Du Chun-Lei(杜春雷)b)
aPhysics Department, Sichuan University, Chengdu 610064, China; bInstitute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, 610209, China
Abstract The use of an attenuated total reflection-coupling mode of prism coated with metal film to excite the interference of the surface plasmon polaritons (SPPs) was proposed for periodic patterning with a resolution of subwavelength scale. High intensity of electric field can be obtained because of the coupling between SPPs and evanescence under a resonance condition, which can reduce exposure time and improve contrast. In this paper, several critical parameters for maskless surface plasmon resonant lithography are described, and the preliminary simulation based on a finite difference time-domain technique agrees well with the theoretical analysis, which demonstrates this scheme and provides the theoretical basis for further experiments.
Received: 05 October 2007
Revised: 16 November 2007
Accepted manuscript online:
Fund: Project supported by the National
Basic Research of China (Grant No 2006CD302900-2), the National
Natural Science Foundation of China (Grant No 60676024), and the
Specialized Research Fund of China for the Doctoral Program of
Higher Education (Grant No 20060610006).
Cite this article:
Fang Liang(方亮), Du Jing-Lei(杜惊雷), Guo Xiao-Wei(郭小伟), Wang Jing-Quan(王景全), Zhang Zhi-You(张志友), Luo Xian-Gang(罗先刚), and Du Chun-Lei(杜春雷) The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling 2008 Chin. Phys. B 17 2499
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