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Chin. Phys. B, 2008, Vol. 17(7): 2499-2503    DOI: 10.1088/1674-1056/17/7/025
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The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling

Luo Xian-Ganga, Du Chun-Leia, Fang Liangb, Du Jing-Leib, Guo Xiao-Weib, Wang Jing-Quanb, Zhang Zhi-Youb
a Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, 610209, China; b Physics Department, Sichuan University, Chengdu 610064, China
Abstract  The use of an attenuated total reflection-coupling mode of prism coated with metal film to excite the interference of the surface plasmon polaritons (SPPs) was proposed for periodic patterning with a resolution of subwavelength scale. High intensity of electric field can be obtained because of the coupling between SPPs and evanescence under a resonance condition, which can reduce exposure time and improve contrast. In this paper, several critical parameters for maskless surface plasmon resonant lithography are described, and the preliminary simulation based on a finite difference time-domain technique agrees well with the theoretical analysis, which demonstrates this scheme and provides the theoretical basis for further experiments.
Keywords:  resolution      enhancement      interference lithography      surface plasmon polaritons (SPPs)     
Received:  05 October 2007      Published:  09 July 2008
PACS:  42.82.Cr (Fabrication techniques; lithography, pattern transfer)  
  42.79.Bh (Lenses, prisms and mirrors)  
Fund: Project supported by the National Basic Research of China (Grant No 2006CD302900-2), the National Natural Science Foundation of China (Grant No 60676024), and the Specialized Research Fund of China for the Doctoral Program of Higher Education (Grant No 20060610006).

Cite this article: 

Fang Liang, Du Jing-Lei, Guo Xiao-Wei, Wang Jing-Quan, Zhang Zhi-You, Luo Xian-Gang, Du Chun-Lei The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling 2008 Chin. Phys. B 17 2499

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