Time-dependent photothermal characterization on damage of fused silica induced by pulsed 355-nm laser with high repetition rate

doi:10.1088/1674-1056/ab671d

Abstract Time-dependent damage to fused silica induced by high frequency ultraviolet laser is investigated. Photothermal spectroscopy (PTS) and optical microscopy (OM) are utilized to characterize the evolution of damage pits with irradiation time. Experimental results describe that in the pre-damage stage of fused silica sample irradiated by 355-nm laser, the photothermal spectrum signal undergoes a process from scratch to metamorphism due to the absorption of laser energy by defects. During the visible damage stage of fused silica sample, the photothermal spectrum signal decreases gradually from the maximum value because of the aggravation of the damage and the splashing of the material. This method can be used to estimate the operation lifetime of optical elements in engineering.

Keywords: photothermal spectroscopy fused silica laser-induced damage

Received: 29 September 2019
Revised: 05 December 2019
Accepted manuscript online:

PACS:	79.10.Ca	(Deep-level photothermal spectroscopy)
	42.70.Ce	(Glasses, quartz)
	79.20.Ds	(Laser-beam impact phenomena)

Fund: Project supported by the National Natural Science Foundation of China (Grant No. 51402173) and the Fundamental Research Funds for the Central Universities, China (Grant No. FRF-TP-15-099A1).

Corresponding Authors: Xin Ju
E-mail: jux@ustb.edu.cn

Cite this article:

Chun-Yan Yan(闫春燕), Bao-An Liu(刘宝安), Xiang-Cao Li(李香草), Chang Liu(刘畅), Xin Ju(巨新) Time-dependent photothermal characterization on damage of fused silica induced by pulsed 355-nm laser with high repetition rate 2020 Chin. Phys. B 29 027901

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Time-dependent photothermal characterization on damage of fused silica induced by pulsed 355-nm laser with high repetition rate

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