Analysis of the spatial filter of a dielectric multilayer film reflective cutoff filter-combination device
Zhang Ying (章瑛)a b, Qi Hong-Ji (齐红基)a, Yi Kui (易葵)a, Wang Yan-Zhi (王胭脂)a, Sui Zhan (隋展)c, Shao Jian-Da (邵建达)a
a Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China; b Graduate School of the Chinese Academy of Sciences, Beijing 100049, China; c Research Center of Laser Fusion, Chinese Academy of Engineering Physics, Mianyang 621900, China
Abstract The experiment setup of a reflecting combination device, which has more advantages than a transmitting combination device, is designed in this study. To achieve angular spectrum selectivity, only one type of reflective component is needed, so difficulties of design and preparation are reduced. A dielectric multilayer film is applied to the reflective component, and the long wave-pass coating stacks of the structure are designed. To achieve high stopband transmittance and reduce electric field intensity at a wavelength of 1053 nm, an objective function is proposed for designing an optimized coating. The final optimized coating has good spectral characteristics and a high laser-induced damage threshold. A dielectric multilayer film with high reflectance plays an important role in preparing and applying a dielectric multilayer film reflecting cutoff filter-combination device.
Zhang Ying (章瑛), Qi Hong-Ji (齐红基), Yi Kui (易葵), Wang Yan-Zhi (王胭脂), Sui Zhan (隋展), Shao Jian-Da (邵建达) Analysis of the spatial filter of a dielectric multilayer film reflective cutoff filter-combination device 2015 Chin. Phys. B 24 104216
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