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Time-dependent degradation of threshold voltage in AlGaN/GaN high electron mobility transistors |
Ma Xiao-Hua (马晓华)a b, Jiang Yuan-Qi (姜元祺)a b, Wang Xin-Hua (王鑫华)c, Lü Min (吕敏)a b, Zhang Huo (张霍)b, Chen Wei-Wei (陈伟伟)a b, Liu Xin-Yu (刘新宇)c |
a School of Advanced Materials and Nanotechnology, Xidian University, Xi’an 710071, China; b Key Laboratory for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi’an 710071, China; c Key Laboratory of Microelectronics Device & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China |
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Abstract This paper gives a detailed analysis of the time-dependent degradation of the threshold voltage in AlGaN/GaN high electron mobility transistors (HEMTs) submitted to off-state stress. The threshold voltage shows a positive shift in the early stress, then turns to a negative shift. The negative shift of the threshold voltage seems to have a long recovery time. A model related with the balance of electron trapping and detrapping induced by shallow donors and deep acceptors is proposed to explain this degradation mode.
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Received: 08 March 2013
Revised: 18 April 2013
Accepted manuscript online:
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PACS:
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73.40.Kp
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(III-V semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions)
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73.50.Gr
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(Charge carriers: generation, recombination, lifetime, trapping, mean free paths)
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73.61.Ey
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(III-V semiconductors)
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Fund: Project supported by the Program for New Century Excellent Talents in Universities, China (Grant No. NCET-12-0915). |
Corresponding Authors:
Ma Xiao-Hua
E-mail: xhma@xidian.edu.cn
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Cite this article:
Ma Xiao-Hua (马晓华), Jiang Yuan-Qi (姜元祺), Wang Xin-Hua (王鑫华), Lü Min (吕敏), Zhang Huo (张霍), Chen Wei-Wei (陈伟伟), Liu Xin-Yu (刘新宇) Time-dependent degradation of threshold voltage in AlGaN/GaN high electron mobility transistors 2014 Chin. Phys. B 23 017303
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