Research of photolithography technology based on surface plasmon

doi:10.1088/1674-1056/19/11/114203

Abstract This paper demonstrates a new process of the photolithography technology, used to fabricate simply fine patterns, by employing surface plasmon character. The sub-wavelength periodic silica structures with uniform silver film are used as the exposure mask. According to the traditional semiconductor process, the grating structures are fabricated at exposing wavelength of 436 nm. At the same time, it provides additional and quantitative support of this technique based on the finite-difference time-domain method. The results of the research show that surface plasmon characteristics of metals can be used to increase the optical field energy distribution differences through the silica structures with silver film, which directly impact on the exposure of following photosensitive layer in different regions.

Keywords: surface plasmons lithography finite-difference time-domain sub-wavelength periodic structure

Received: 24 September 2009
Revised: 11 May 2010
Accepted manuscript online:

PACS:	42.79.Dj	(Gratings)
	42.82.Cr	(Fabrication techniques; lithography, pattern transfer)
	73.20.Mf	(Collective excitations (including excitons, polarons, plasmons and other charge-density excitations))

Fund: Project supported by the National Natural Science Foundation of China (Grant No. 60808014), the Shanghai Committee of Science and Technology of China (Grant No. 0852nm06600).

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Li Hai-Hua(李海华), Chen Jian(陈健), and Wang Qing-Kang(王庆康) Research of photolithography technology based on surface plasmon 2010 Chin. Phys. B 19 114203

[1]	Wood R W 1902 Proc. Phys. Soc. London 18 269
[2]	Ebbesen T W, Lezec H J, Ghaemi H F, Thio T and Wolff P A 1998 Nature 391 667
[3]	Lezec H J, Degiron A, Devaux E, Linke R A, Martin-Moreno L, Garcia-Vidal F J and Ebbeseb T W 2002 Science 297 820
[4]	Thio T, Pellerin K M, Linke R A, Lezec H J and Ebbesen T W 2001 Opt. Lett. 26 1972
[5]	Fang L, Du J L, Guo X W, Wang J Q, Zhang Z Y, Luo X G and Du C L 2008 Chin. Phys. B 17 249
[6]	Srituravanich W, Fang N, Durant S, Ambati M, Sun C and Zhang X 2004 J. Vac. Sci. Technol. B 22 3475
[7]	Liu Z, Steele J M, Srituravanich W, Pikus Y, Sun C and Zhang X 2005 Nano Lett. 5 1726
[8]	Srituravanich W, Durant S, Lee H, Sun C and Zhang X 2005 J. Vac. Sci. Technol. B 23 2636
[9]	Zhou R L, Chen X S, Zeng Y, Zhang J B, Chen H, Wang S W, Lu W, Li H J, Xia H and Wang L L 2008 Acta Phys. Sin. 57 3506 (in Chinese)
[10]	Cao Z Q 2009 Waveguide Optics (Beijing: Science Press) p132 (in Chinese)
[11]	Barnes W L, Dereux A and Ebbesen T W 2003 Nature 424 824
[12]	Sun A J and Zeng D Y 2008 Journal of Modern Optis 55 1639

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Research of photolithography technology based on surface plasmon

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