Numerical simulation of chemical processes in atmospheric plasmas
Ouyang Jian-Ming (欧阳建明)ab, Guo Wei (郭伟)b, Wang Long (王龙)b, Shao Fu-Qiu (邵福球)a
a National University of Defence Science and Technology, Changsha 410073, China; b Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
Abstract A model is built to study chemical processes in atmospheric plasmas at low altitude (high pressure) and at high altitude (low pressure). The plasma lifetime and the temporal evolution of the main charged species are presented. The electron number density does not strictly obey the exponential damping law in a long period. The heavy charged species are dominant at low altitude in comparison with the light species at high altitude. Some species of small amount in natural air play an important role in the processes.
Received: 25 May 2004
Revised: 24 June 2004
Accepted manuscript online:
PACS:
92.60.H-
(Atmospheric composition, structure, and properties)
Ouyang Jian-Ming (欧阳建明), Guo Wei (郭伟), Wang Long (王龙), Shao Fu-Qiu (邵福球) Numerical simulation of chemical processes in atmospheric plasmas 2004 Chinese Physics 13 2174
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