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Chin. Phys. B, 2017, Vol. 26(3): 038502    DOI: 10.1088/1674-1056/26/3/038502
INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY Prev   Next  

Superjunction nanoscale partially narrow mesa IGBT towards superior performance

Qiao-Qun Yu(喻巧群), Jiang Lu(陆江), Hai-Nan Liu(刘海南), Jia-Jun Luo(罗家俊), Bo Li(李博), Li-Xin Wang(王立新), Zheng-Sheng Han(韩郑生)
Institute of Microelectronics of Chinese Academy of Science, Key Laboratory of Silicon Device Technology, Chinese Academy of Sciences, Beijing 100029, China
Abstract  We present a detailed study of a superjunction (SJ) nanoscale partially narrow mesa (PNM) insulated gate bipolar transistor (IGBT) structure. This structure is created by combining the nanoscale PNM structure and the SJ structure together. It demonstrates an ultra-low saturation voltage (Vce(sat)) and low turn-off loss (Eoff) while maintaining other device parameters. Compared with the conventional 1.2 kV trench IGBT, our simulation result shows that the Vce(sat) of this structure decreases to 0.94 V, which is close to the theoretical limit of 1.2 kV IGBT. Meanwhile, the fall time decreases from 109.7 ns to 12 ns and the Eoff is down to only 37% of that of the conventional structure. The superior tradeoff characteristic between Vce(sat) and Eoff is presented owing to the nanometer level mesa width and SJ structure. Moreover, the short circuit degeneration phenomenon in the very narrow mesa structure due to the collector-induced barriers lowering (CIBL) effect is not observed in this structure. Thus, enough short circuit ability can be achieved by using wide, floating P-well technique. Based on these structure advantages, the SJ-PNM-IGBT with nanoscale mesa width indicates a potentially superior overall performance towards the IGBT parameter limit.
Keywords:  insulated gate bipolar transistor (IGBT)      partially narrow mesa (PNM)      superjunction (SJ)      turn-off loss  
Received:  09 November 2016      Revised:  19 December 2016      Accepted manuscript online: 
PACS:  85.30.De (Semiconductor-device characterization, design, and modeling)  
  85.30.Pq (Bipolar transistors)  
  85.30.Tv (Field effect devices)  
Fund: Project supported by the National Natural Science Foundation of China (Grant No. 61404161).
Corresponding Authors:  Jiang Lu     E-mail:  lujiang@ime.ac.cn

Cite this article: 

Qiao-Qun Yu(喻巧群), Jiang Lu(陆江), Hai-Nan Liu(刘海南), Jia-Jun Luo(罗家俊), Bo Li(李博), Li-Xin Wang(王立新), Zheng-Sheng Han(韩郑生) Superjunction nanoscale partially narrow mesa IGBT towards superior performance 2017 Chin. Phys. B 26 038502

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