Effects of gas pressure on plasma characteristics in dual frequency argon capacitive glow discharges at low pressure by a self-consistent fluid model

doi:10.1088/1674-1056/26/12/125201

Abstract A self-consistent fluid model for dual radio frequency argon capacitive glow discharges at low pressure is established. Numerical results are obtained by using a finite difference method to solve the model numerically, and the results are analyzed to study the effect of gas pressure on the plasma characteristics. It shows that when the gas pressure increases from 0.3 Torr (1 Torr=1.33322×10² Pa) to 1.5 Torr, the cycle-averaged plasma density and the ionization rate increase; the cycle-averaged ion current densities and ion energy densities on the electrodes electrode increase; the cycle-averaged electron temperature decreases. Also, the instantaneous electron density in the powered sheath region is presented and discussed. The cycle-averaged electric field has a complex behavior with the increasing of gas pressure, and its changes take place mainly in the two sheath regions. The cycle-averaged electron pressure heating, electron ohmic heating, electron heating, and electron energy loss are all influenced by the gas pressure. Two peaks of the electron heating appear in the sheath regions and the two peaks become larger and move to electrodes as the gas pressure increases.

Keywords: dual frequency gas pressure glow discharge

Received: 29 June 2017
Revised: 30 August 2017
Accepted manuscript online:

PACS:	52.25.Jm	(Ionization of plasmas)
	52.30.Ex	(Two-fluid and multi-fluid plasmas)
	52.50.Qt	(Plasma heating by radio-frequency fields; ICR, ICP, helicons)
	52.65.-y	(Plasma simulation)

Fund: Project supported by the National Natural Science Foundation of China (Grant No. 51172101).

Corresponding Authors: Yue Liu
E-mail: liuyue@dlut.edu.cn

Cite this article:

Lu-Lu Zhao(赵璐璐), Yue Liu(刘悦), Tagra Samir Effects of gas pressure on plasma characteristics in dual frequency argon capacitive glow discharges at low pressure by a self-consistent fluid model 2017 Chin. Phys. B 26 125201

[1]	Kim H C, Lee J K and Shon J W 2003 Phys. Plasmas 10 4545
[2]	Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Material Processing (New York:Wiley)
[3]	Kim H C and Lee J K 2005 Phys. Plasmas 12 053501
[4]	Georgieva V and Bogaerts A 2005 J. Appl. Phys. 98 023308
[5]	Kawamura E, Lieberman M A and Lichtenberg A J 2006 Phys. Plasmas 13 053506
[6]	Liu Y X, Zhang Q Z, Jiang W, Hou L J, Jiang X Z, Lu W Q and Wang Y N 2011 Phys. Rev. Lett. 107 055002
[7]	Lisovskiy V, Booth J P, Landry K, Douai D, Cassagne V and Yegorenkov V 2008 Plasma Sources Sci. Technol. 17 025002
[8]	Schulze J, Schüngel E, Czarnetzki U and Donkó Z 2009 J. Appl. Phys. 106 063307
[9]	Kim D B, Moon S Y and Jung H, Gweon B and Choec W 2010 Phys. Plasmas 17 053508
[10]	Li Z C, Chang D L, Li X S, Bi Z H, Lu W Q, Xu Y, Zhu A M and Wanga Y N 2010 Phys. Plasmas 17 033501
[11]	Jiang X Z, Liu Y X, Lu W Q, Bi Z H, Gao F and Wang Y N 2012 Vacuum 86 881
[12]	Yu Y Q, Xin Y, Lu W Q and Ning Z Y 2011 Plasma Sci. Technol. 13 571
[13]	Jiang W, Mao M and Wang Y N 2006 Phys. Plasmas 13 113502
[14]	Bora B 2015 Phys. Plasmas 22 103503
[15]	Wang S, Xu X and Wang Y N 2007 Phys. Plasmas 14 113501
[16]	Schulze J, Derzsi A and Donkó Z 2011 Plasma Sources Sci. Technol. 20 045008
[17]	Dai Z L, Xu X and Wang Y N 2007 Phys. Plasmas 14 013507
[18]	Donkó Z and Petrovic Z L 2007 J. Phys.:Conf. Ser. 86 012011
[19]	Bi Z H, Dai Z L, Xu X, Li Z C and Wang Y N 2009 Phys. Plasmas 16 043510
[20]	Zhang Q Z, Liu Y X, Jiang W, Bogaerts A and Wang Y N 2013 Plasma Sources Sci. Technol. 22 025014
[21]	Yuan Q H, Xin Y, Yin G Q, Huang X J, Sun K and Ning Z Y 2008 J. Phys. D:Appl. Phys. 41 205209
[22]	Yuan Q H, Yin G Q, Xin Y and Ning Z Y 2011 Phys. Plasmas 18 053501
[23]	Lymberopoulos D P and Economou D J 1993 J. Appl. Phys. 73 3668
[24]	Liu Q, Liu Y, Samir T and Ma Z S 2014 Phys. Plasmas 21 083511
[25]	Lafleur T, Chabert P and Booth J P 2014 Plasma Sources Sci. Technol. 23 035010
[26]	Gahan D and Hopkins M B 2006 J. Appl. Phys. 100 043304
[27]	Turner M M and Chabert P 2006 Phys. Rev. Lett. 96 205001
[28]	Schulze J, Derzsi A, Dittmann K, Hemke T, Meichsner J and Donko'Z 2011 Phys. Rev. Lett. 107 275001
[29]	Belenguer P and Boeuf J P 1990 Phys. Rev. A 41 4447
[30]	Liu R Q, Liu Y, Jia W Z and Zhou Y W 2017 Phys. Plasmas 24 013517
[31]	Semmler E, Awakowicz P and Keudell A V 2007 Plasma Sources Sci. Technol. 16 839

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Effects of gas pressure on plasma characteristics in dual frequency argon capacitive glow discharges at low pressure by a self-consistent fluid model

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