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An improvement to computational efficiency of the drain current model for double-gate MOSFET |
Zhou Xing-Ye(周幸叶)a)b), Zhang Jian(张健) a), Zhou Zhi-Ze(周致赜)a), Zhang Li-Ning(张立宁)a), Ma Chen-Yue(马晨月) a), Wu Wen(吴文)c), Zhao Wei(赵巍)c), and Zhang Xing(张兴) a)† |
a TSRC, Institute of Microelectronics, School of Electronic Engineering and Computer Science, Peking University, Beijing 100871, China; b Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, China; c Peking University Shenzhen SOC Key Laboratory, PKU-HKUST Shenzhen Institution, Shenzhen 518057, China |
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Abstract As a connection between the process and the circuit design, the device model is greatly desired for emerging devices, such as the double-gate MOSFET. Time efficiency is one of the most important requirements for device modeling. In this paper, an improvement to the computational efficiency of the drain current model for double-gate MOSFETs is extended, and different calculation methods are compared and discussed. The results show that the calculation speed of the improved model is substantially enhanced. A two-dimensional device simulation is performed to verify the improved model. Furthermore, the model is implemented into the HSPICE circuit simulator in Verilog-A for practical application.
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Received: 18 January 2011
Revised: 28 February 2011
Accepted manuscript online:
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PACS:
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73.40.Ty
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(Semiconductor-insulator-semiconductor structures)
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73.40.Qv
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(Metal-insulator-semiconductor structures (including semiconductor-to-insulator))
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61.44.Br
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(Quasicrystals)
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Cite this article:
Zhou Xing-Ye(周幸叶), Zhang Jian(张健), Zhou Zhi-Ze(周致赜), Zhang Li-Ning(张立宁), Ma Chen-Yue(马晨月), Wu Wen(吴文), Zhao Wei(赵巍), and Zhang Xing(张兴) An improvement to computational efficiency of the drain current model for double-gate MOSFET 2011 Chin. Phys. B 20 097304
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