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Influence of oxygen on the growth of cubic boron nitride thin films by plasma-enhanced chemical vapour deposition |
Yang Hang-Sheng(杨杭生)† , Nie An-Min(聂安民), and Qiu Fa-Min(邱发敏) |
State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China |
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Abstract Cubic boron nitride thin films were deposited on silicon substrates by low-pressure inductively coupled plasma-enhanced chemical vapour deposition. It was found that the introduction of O2 into the deposition system suppresses both nucleation and growth of cubic boron nitride. At a B2H6 concentration of 2.5% during film deposition, the critical O2 concentration allowed for the nucleation of cubic boron nitride was found to be less than 1.4%, while that for the growth of cubic boron nitride was higher than 2.1%. Moreover, the infrared absorption peak observed at around 1230--1280 cm-1, frequently detected for cubic boron nitride films prepared using non-ultrahigh vacuum systems, appears to be due to the absorption of boron oxide, a contaminant formed as a result of the oxygen impurity. Therefore, the existence of trace oxygen contamination in boron nitride films can be evaluated qualitatively by this infrared absorption peak.
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Received: 16 July 2009
Revised: 27 July 2009
Accepted manuscript online:
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PACS:
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68.55.-a
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(Thin film structure and morphology)
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68.55.A-
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(Nucleation and growth)
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68.55.Ln
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(Defects and impurities: doping, implantation, distribution, concentration, etc.)
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78.30.Hv
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(Other nonmetallic inorganics)
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78.66.Li
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(Other semiconductors)
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81.15.Gh
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(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
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Fund: Project supported by the National
Natural Science Foundation of China (Grant No. 50772096) and the
Educational Department of Zhejiang Province, China (Grant No.
20061365). |
Cite this article:
Yang Hang-Sheng(杨杭生), Nie An-Min(聂安民), and Qiu Fa-Min(邱发敏) Influence of oxygen on the growth of cubic boron nitride thin films by plasma-enhanced chemical vapour deposition 2010 Chin. Phys. B 19 017202
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[1] |
Yoshida T 1996 Diamond Relat. Mater. 5 501
|
[2] |
Mirkarimi P B, McCarty K F and Medlin D L 1997 Mater. Sci. Eng. R 21 47
|
[3] |
Samantaray C B and Singh R N 2005 Int. Mater. Rev. 50 313
|
[4] |
Zhang X W, You J B and Chen N F 2007 J. Inorgan. Mater. 22 385
|
[5] |
Yang H S, Nie A M and Zhang J Y 2009 Acta Phys. Sin. 58 1364 (in Chinese)
|
[6] |
Matsumoto S and Zhang W J 2000 Jpn. J. Appl. Phys. (Part 2) 39 L442
|
[7] |
Yang H S, Iwamoto C and Yoshida T 2003 J. Appl. Phys. 94 1248
|
[8] |
Zhang X W, Boyen H G, Deyneka N, Ziemann P, Banhart F and Schreck M 2003 Nature Mater. 2 312
|
[9] |
Nose K, Yang H S and Yoshida T 2005 Diamond Relat. Mater. 14 1297
|
[10] |
Nose K, Oba H and Yoshida T 2006 Appl. Phys. Lett. 89 112124
|
[11] |
Yang H S, Iwamoto C and Yoshida T 2007 Diamond Relat. Mater. 16 642
|
[12] |
Zhang W J, Bello I, Lifshitz Y, Chan K M, Wu Y, Chan C Y, Meng X M and Lee S T 2004 Appl. Phys. Lett. 85 1344
|
[13] |
Yang H S and Xie Y J 2007 Acta Phys. Sin. 56 5400 (in Chinese)
|
[14] |
Tian J Z, Lu F X and Xia L F 2001 Acta Phys. Sin. 50 210 (in Chinese)
|
[15] |
Ma X Y, Yue J S, He D Y and Chen G H 1998 Acta Phys. Sin. 47 871 (in Chinese)
|
[16] |
Ulrich S, Nold E, Sell K, Stüber M, Ye J and Ziebert C 2006 Surf. Coat. Technol. 200 6465
|
[17] |
Lattemann M, Ulrich S and Ye J 2006 Thin Solid Films 515 1058
|
[18] |
Zapien J A, Collins R W and Messier R 2002 J. Vac. Sci. Technol. A 20 1395
|
[19] |
Yang H S, Iwamoto C and Yoshida T 2002 Thin Solid Films 407 67
|
[20] |
Gielisse P J, Mitra S S, Plendl J N, Griffs R D, Mansur L C, Marshall R and Pascoe E A 1967 Phys. Rev. 155 1039
|
[21] |
Yang H S, Iwamoto C and Yoshida T 2002 J. Appl. Phys. 91 6695
|
[22] |
Ullmann J, Baglin J E E and Kellock A J 1998 J. Appl. Phys. 83 2980
|
[23] |
Yang H S, Zhang Y, Zhang X B and Xu Y B 2007 Appl. Phys. Lett. 91 061907
|
[24] |
Yang H S, Zhang J Y, Nie A M and Zhang X B 2008 Chin. Phys. B 17 3453
|
[25] |
Turkevich V Z 1999 Diamond Relat. Mater. 8 2032
|
[26] |
Hubert H, Gravie L, Buseck P, Petuskey W and McMillan P 1996 12th Int. Symp. on Boron, Borides and Related Compounds p56 Baden, Austria, August 25--30 1996
|
[27] |
Perevertailo V M, Smekhnov A A, Kuzenkov S P and Loginova O B 1994 J. Superhard Mater. 16 18
|
[28] |
Amagi S, Takahashi D and Yoshida T 1997 Appl. Phys. Lett. 70 946
|
[29] |
Orellana W and Chacham H 2000 Phys. Rev. B 62 10135
|
[30] |
Pisarski W A, Gorvczka T, Wodecka-Dus B, Plonska M and Pisarska J 2005 Mater. Sci. Eng. B 122 94
|
[31] |
Schneider J R and Shrader B 1975 Mol. Struct. 29 1
|
[32] |
Nagai N, Imai T, Terada K, Seki H, Okumura H, Fujino H, Yamamoto T, Nishiyama I and Hatta A 2002 Surf. Interface Anal. 34 545
|
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