CLASSICAL AREAS OF PHENOMENOLOGY |
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Fabrication of two- and three-dimensional periodic submicron structures by holographic lithography with a 635 nm laserand matched photopolymer |
Zhu Teng-Fei(朱腾飞), Tan Bing-Hui(谭炳辉), Pan Xue-Feng(潘雪丰), and Tao Wei-Dong(陶卫东)† |
College of Science, Ningbo University, Ningbo 315211, China |
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Abstract 2D and 3D submicron periodic structures are first fabricated by red-induced photopolymerization using a common 635 nm semiconductor laser and specially developed red-sensitive polymer material. The principle of this new photo-polymer material fabrication is explained and the absorption spectra of the material are measured. This fabrication technique allows a deeper penetration into volume and larger interference irradiation area which is more than 1 cm2. The optical design, theoretical calculations and experimental results including diffraction patterns verifying the formation of periodic structures are presented. Compared with other fabrication technologies using high-power lasers, this approach has greatly reduced the demand for laser apparatus. Therefore, it is much more accessible to most laboratories and potentially usable in holographic fabrication of photonic crystals and devices in micro electro-mechanical systems (MEMS).
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Received: 30 May 2009
Revised: 03 July 2009
Accepted manuscript online:
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PACS:
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42.70.Jk
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(Polymers and organics)
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42.82.Cr
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(Fabrication techniques; lithography, pattern transfer)
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81.05.Lg
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(Polymers and plastics; rubber; synthetic and natural fibers; organometallic and organic materials)
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82.35.-x
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(Polymers: properties; reactions; polymerization)
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82.50.-m
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(Photochemistry)
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85.85.+j
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(Micro- and nano-electromechanical systems (MEMS/NEMS) and devices)
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Fund: Projiect supported by the National Key
Basic Research Special Fund of China (Grant No. 2004CB719805) and
the Ningbo Natural Science Foundation, China (Grant No.
2009A610011). |
Cite this article:
Zhu Teng-Fei(朱腾飞), Tan Bing-Hui(谭炳辉), Pan Xue-Feng(潘雪丰), and Tao Wei-Dong(陶卫东) Fabrication of two- and three-dimensional periodic submicron structures by holographic lithography with a 635 nm laserand matched photopolymer 2010 Chin. Phys. B 19 014218
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