Confinement-induced nanocrystal alignment of conjugated polymer by the soft-stamped nanoimprint lithography

doi:10.1088/1674-1056/24/10/104215

Abstract

Soft-stamped nanoimprint lithography (NIL) is considered as one of the most effective processes of nanoscale patterning because of its low cost and high throughput. In this work, this method is used to emboss the poly (9, 9-dioctylfluorene) film. By reducing the linewidth of the nanogratings on the stamp, the orientations of nanocrystals are confined along the grating vector in the nanoimprint process, where the confinement linewidth is comparable to the geometrical size of the nanocrystal. When the linewidth is about 400 nm, the poly (9, 9-dioctylfluorene) (PFO) nanocrystals could be orderly arranged in the nanogratings, so that both pattern transfer and well-aligned nanocrystal arrangement could be achieved in a single step by the soft-stamped NIL. The relevant mechanism of the nanocrystalline alignment in these nanogratings is fully discussed. The modulation of nanocrystal alignment is of benefit to the charge mobilities and other performances of PFO-based devices for the future applications.

Keywords: conjugated polymer soft lithography nanocrystalline material x-ray technique

Received: 20 May 2015
Revised: 17 June 2015
Accepted manuscript online:

PACS:	42.70.Jk	(Polymers and organics)
	81.16.Nd	(Micro- and nanolithography)
	61.82.Rx	(Nanocrystalline materials)
	78.70.Ck	(X-ray scattering)

Fund:

Project supported by the National Natural Science Foundation of China (Grant No. 21204058).

Corresponding Authors: Weng Yu-Yan, Gu Zhen
E-mail: wengyuyan@suda.edu.cn;zgu@email.unc.edu

Cite this article:

Li Xiao-Hui (李晓慧), Yu Ji-Cheng (俞计成), Lu Nai-Yan (陆乃彦), Zhang Wei-Dong (张卫东), Weng Yu-Yan (翁雨燕), Gu Zhen (顾臻) Confinement-induced nanocrystal alignment of conjugated polymer by the soft-stamped nanoimprint lithography 2015 Chin. Phys. B 24 104215

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Confinement-induced nanocrystal alignment of conjugated polymer by the soft-stamped nanoimprint lithography

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