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Simulation research on surface growth process of positive and negative frequency detuning chromium atom lithographic gratings |
| Zhi-Jun Yin(尹志珺)1,2,3,4,5, Zhao-Hui Tang(唐朝辉)1,2,3,4,5, Wen Tan(谭文)1,2,3,4,5, Guang-Xu Xiao(肖光旭)1,2,3,4,5, Yu-Lin Yao(姚玉林)1,2,3,4,5, Dong-Bai Xue(薛栋柏)1,2,3,4,5, Zhen-Jie Gu(顾振杰)1,2,3,4,5, Li-Hua Lei(雷李华)6, Xiong Dun(顿雄)1,2,3,4,5, Xiao Deng(邓晓)1,2,3,4,5,†, Xin-Bin Cheng(程鑫彬)1,2,3,4,5, and Tong-Bao Li(李同保)1,2,3,4,5 |
1 Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China;
2 School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;
3 MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai 200092, China;
4 Shanghai Frontiers Science Center of Digital Optics, Shanghai 200092, China;
5 Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Shanghai 200092, China;
6 Shanghai Institute of Measurement and Testing Technology, Shanghai 201203, China |
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Abstract Chromium atom photolithography gratings are a promising technology for the development of nanoscale length standard substances due to their high accuracy, uniformity, and consistency. However, the inherent difference between the interaction of positive and negative frequency detuning standing wave field and the atoms can cause a difference in the adjacent peak-to-valley heights of the grating in positive and negative frequency detuning chromium atom lithography, which greatly reduces its accuracy. In this study, we performed a controlled variable growth simulation using the semi-classical theoretical model and Monte Carlo method with trajectory tracking and ballistic deposition methods to investigate the influence of key experimental parameters on the surface growth process of positive and negative frequency detuning atomic lithography gratings. We established a theoretical model based on simulation results and summarized empirical equations to guide the selection of experimental parameters. Our simulations achieved uniform positive and negative frequency detuning atomic lithography gratings with a period of 1/4 of the wavelength corresponding to the atomic transition frequency, and adjacent peak-to-valley heights differing by no more than 2 nm, providing an important theoretical reference for the controllable fabrication of these gratings.
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Received: 07 March 2023
Revised: 14 July 2023
Accepted manuscript online: 21 July 2023
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PACS:
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06.20.-f
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(Metrology)
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11.15.Kc
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(Classical and semiclassical techniques)
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42.79.Dj
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(Gratings)
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43.25.Gf
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(Standing waves; resonance)
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| Fund: Project supported by the National Natural Science Foundation of China (Grant No. 62075165), the National Key Research and Development Program of China (Grant Nos. 2022YFF0607600 and 2022YFF0605502), the Special Development Funds for Major Projects of Shanghai Zhangjiang National Independent Innovation Demonstration Zone (Grant No. ZJ2021ZD008), the Shanghai Natural Science Foundation (Grant No. 21ZR1483100), the Shanghai Academic/Technology Research Leader (Grant No. 21XD1425000), and the Opening Fund of Shanghai Key Laboratory of Online Detection and Control Technology (Grant No. ZX2020101). |
Corresponding Authors:
Xiao Deng
E-mail: 18135@tongji.edu.cn
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Cite this article:
Zhi-Jun Yin(尹志珺), Zhao-Hui Tang(唐朝辉), Wen Tan(谭文), Guang-Xu Xiao(肖光旭), Yu-Lin Yao(姚玉林), Dong-Bai Xue(薛栋柏), Zhen-Jie Gu(顾振杰), Li-Hua Lei(雷李华), Xiong Dun(顿雄), Xiao Deng(邓晓), Xin-Bin Cheng(程鑫彬), and Tong-Bao Li(李同保) Simulation research on surface growth process of positive and negative frequency detuning chromium atom lithographic gratings 2023 Chin. Phys. B 32 100601
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