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Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography |
Zhang Wan-Jing (张万经), Ma Yan (马艳), Li Tong-Bao (李同保), Zhang Ping-Ping (张萍萍), Deng Xiao (邓晓), Chen Sheng (陈晟), Xiao Sheng-Wei (肖盛炜 ) |
Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Department of Physics, Tongji University, Shanghai 200092, China |
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Abstract Direct-write atom lithography, one of the potential nanofabrication techniques, is restricted by some difficulties in producing optical masks for the deposition of complex structures. In order to bring a further progress, a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions. The best collimation is obtained when the laser red detunes by natural line-width of transition 7S3 → 7P40 of chromium atom. The collimation ratio is 0.45 vertically (in x axis), and it is 0.55 horizontally (in y axis). The theoretical model is also simulated, and a success of our structured mirror array is achieved.
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Received: 19 July 2012
Revised: 01 November 2012
Accepted manuscript online:
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PACS:
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37.10.De
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(Atom cooling methods)
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37.10.Gh
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(Atom traps and guides)
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42.50.Wk
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(Mechanical effects of light on material media, microstructures and particles)
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Fund: Project supported by the Shanghai Nanoscience Foundation, China (Grant Nos. 0852nm07000 and 0952nm07000); the National Natural Science Foundation of China (Grant Nos. 10804084 and 91123022); the National Key Technology R & D Program, China (Grant No. 2006BAF06B08); and the Specialized Research Fund for the Doctoral Program of Ministry of High Education of China (Grant No. 200802471008). |
Corresponding Authors:
Ma Yan
E-mail: mayan@tongji.edu.cn
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Cite this article:
Zhang Wan-Jing (张万经), Ma Yan (马艳), Li Tong-Bao (李同保), Zhang Ping-Ping (张萍萍), Deng Xiao (邓晓), Chen Sheng (陈晟), Xiao Sheng-Wei (肖盛炜 ) Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography 2013 Chin. Phys. B 22 023701
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