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Chin. Phys. B, 2021, Vol. 30(9): 095204    DOI: 10.1088/1674-1056/abf104

Discharge characteristic of very high frequency capacitively coupled argon plasma

Gui-Qin Yin(殷桂琴), Jing-Jing Wang(王兢婧), Shan-Shan Gao(高闪闪), Yong-Bo Jiang(姜永博), and Qiang-Hua Yuan(袁强华)
Key Laboratory of Atomic and Molecular Physics&Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China
Abstract  The discharge characteristics of capacitively coupled argon plasmas driven by very high frequency discharge are studied. The mean electron temperature and electron density are calculated by using the Ar spectral lines at different values of power (20 W-70 W) and four different frequencies (13.56 MHz, 40.68 MHz, 94.92 MHz, and 100 MHz). The mean electron temperature decreases with the increase of power at a fixed frequency. The mean electron temperature varies non-linearly with frequency increasing at constant power. At 40.68 MHz, the mean electron temperature is the largest. The electron density increases with the increase of power at a fixed frequency. In the cases of driving frequencies of 94.92 MHz and 100 MHz, the obtained electron temperatures are almost the same, so are the electron densities. Particle-in-cell/Monte-Carlo collision (PIC/MCC) method developed within the Vsim 8.0 simulation package is used to simulate the electron density, the potential distribution, and the electron energy probability function (EEPF) under the experimental condition. The sheath width increases with the power increasing. The EEPF of 13.56 MHz and 40.68 MHz are both bi-Maxwellian with a large population of low-energy electrons. The EEPF of 94.92 MHz and 100 MHz are almost the same and both are nearly Maxwellian.
Keywords:  very high frequency discharges      capacitively coupled plasma      particle-in-cell/Monte-Carlo collisions  
Received:  24 December 2020      Revised:  02 March 2021      Accepted manuscript online:  23 March 2021
PACS:  52.80.Pi (High-frequency and RF discharges)  
  52.25.-b (Plasma properties)  
  52.65.-y (Plasma simulation)  
Fund: Project supported by the National Natural Science Foundation of China (Grant No. 11665021) and the Natural Science Foundation of Gansu Province, China (Grant No. 20JR10RA078).
Corresponding Authors:  Gui-Qin Yin     E-mail:

Cite this article: 

Gui-Qin Yin(殷桂琴), Jing-Jing Wang(王兢婧), Shan-Shan Gao(高闪闪), Yong-Bo Jiang(姜永博), and Qiang-Hua Yuan(袁强华) Discharge characteristic of very high frequency capacitively coupled argon plasma 2021 Chin. Phys. B 30 095204

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