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Microstructure and properties of Nb/Ta multilayer films irradiated by high current pulse electron beam |
| Ma Xin-Xin (马欣新)a b, Guo Guang-Wei (郭光伟)a c, Tang Guang-Ze (唐光泽)d, Sun Ming-Ren (孙明仁)b, Wang Li-Qin (王黎钦)e |
a State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China;
b National Key Laboratory of Science and Technology on Precision Hot Processing of Metals, Harbin Institute of Technology, Harbin 150001, China;
c Key Laboratory on Materials Behavior & Evaluation Technology in Space Environment, Harbin Institute of Technology, Harbin 150001, China;
d School of Mechanical Science and Engineering, Northeast Petroleum University, Daqing 163318, China;
e School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, China |
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Abstract Nb/Ta multilayer films deposited on Ti6Al4V substrate with Nb and Ta monolayer thicknesses of 30 nm, 120 nm, and 240 nm were irradiated by high current pulse electron beam (HCPEB) to prepare Nb-Ta alloyed layers. The microstructure and the composition of the outmost surface of melted alloyed layers were investigated using transmission electron microscope (TEM) equipped with X-ray energy dispersive spectrometer (EDS) attachment. The Ta content of the alloyed surface layer prepared from the monolayer of thickness 30 nm, 120 nm, and 240 nm was ～ 27.7 at.%, 6.37 at.%, and 0 at.%, respectively. It was found that the Ta content in the alloyed layer plays a dominant role in the microstructure of the films. The hardness and the wear rate of the alloyed layers decrease with the increasing content of Ta in the surface layer.
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Received: 26 June 2012
Revised: 10 January 2013
Accepted manuscript online:
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PACS:
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62.20.Qp
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(Friction, tribology, and hardness)
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68.37.Lp
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(Transmission electron microscopy (TEM))
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68.55.Nq
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(Composition and phase identification)
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68.65.Ac
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(Multilayers)
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| Fund: Project supported by the National Basic Research Program of China (Grant No. 2013CB632305), the Guangdong Province University-Industry Cooperation Project of the Ministry of Education, China (Grant No. 2010B090400444), the Guangdong International Cooperation Projects, China (Grant No. 2010B050900003), and the Guangdong Science and Technology Plan Projects, China (Grant No. 2010A070500002). |
Corresponding Authors:
Tang Guang-Ze
E-mail: oaktang@hit.edu.cn
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Cite this article:
Ma Xin-Xin (马欣新), Guo Guang-Wei (郭光伟), Tang Guang-Ze (唐光泽), Sun Ming-Ren (孙明仁), Wang Li-Qin (王黎钦) Microstructure and properties of Nb/Ta multilayer films irradiated by high current pulse electron beam 2013 Chin. Phys. B 22 056202
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