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Chin. Phys. B, 2010, Vol. 19(2): 026804    DOI: 10.1088/1674-1056/19/2/026804
CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES Prev   Next  

Structural and optical properties of Al1-xInxN epilayers on GaN template grown by metalorganic chemical vapor deposition

Lu Guo-Jun(卢国军)a), Zhu Jian-Jun(朱建军)a), Jiang De-Sheng(江德生)a), Wang Yu-Tian(王玉田) a),Zhao De-Gang(赵德刚)a), Liu Zong-Shun(刘宗顺)a),Zhang Shu-Ming(张书明) a), and Yang Hui(杨辉)a)b)
a State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, the Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China; b Suzhou Institute of Nano-tech and Nano-bionics, the Chinese Academy of Sciences, Suzhou 215123, China
Abstract  This paper reports that Al1-xInxN epilayers were grown on GaN template by metalorganic chemical vapor deposition with an In content of 7%--20%. X-ray diffraction results indicate that all these Al1-xInxN epilayers have a relatively low density of threading dislocations. Rutherford backscattering/channeling measurements provide the exact compositional information and show that a gradual variation in composition of the Al1-xInxN epilayer happens along the growth direction. The experimental results of optical reflection clearly show the bandgap energies of Al1-xInxN epilayers. A bowing parameter of 6.5 eV is obtained from the compositional dependence of the energy gap. The cathodoluminescence peak energy of the Al1-xInxN epilayer is much lower than its bandgap, indicating a relatively large Stokes shift in the Al1-xInxN sample.
Keywords:  metalorganic chemical vapor deposition      Al1-xInxN      gradual variation in composition      optical reflectance spectra  
Received:  24 March 2009      Revised:  02 June 2009      Accepted manuscript online: 
PACS:  68.55.-a (Thin film structure and morphology)  
  81.15.Gh (Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))  
  78.66.Fd (III-V semiconductors)  
  68.55.Ln (Defects and impurities: doping, implantation, distribution, concentration, etc.)  
  78.60.Hk (Cathodoluminescence, ionoluminescence)  
  61.72.Hh (Indirect evidence of dislocations and other defects (resistivity, slip, creep, strains, internal friction, EPR, NMR, etc.))  
Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 60776047, 60506001, 60476021, 60576003 and 60836003).

Cite this article: 

Lu Guo-Jun(卢国军), Zhu Jian-Jun(朱建军), Jiang De-Sheng(江德生), Wang Yu-Tian(王玉田),Zhao De-Gang(赵德刚), Liu Zong-Shun(刘宗顺),Zhang Shu-Ming(张书明), and Yang Hui(杨辉) Structural and optical properties of Al1-xInxN epilayers on GaN template grown by metalorganic chemical vapor deposition 2010 Chin. Phys. B 19 026804

[1] Lorenz K, Franco N, Alves E, Watson I M, Martin R W andO'Donnell K P 2006 Phys. Rev. Lett. 97 085501
[2] Carlin J F and Ilegems M 2003 Appl. Phys. Lett. 8 3 668
[3] Carlin J F, Zellweger C, Dorsaz J, Nicolay S, Christmann G,Feltin E, ButtéR and Grandjean N 2005 Phys. Stat. Sol. B 242 2326
[4] Dadgar A, Schulze F, Blasing J, Diez A, Krost A, Neuburge M,Kohn E, Daumiller I and Kunze M 2004 Appl. Phys. Lett. 85 5400
[5] Gonschorek M, Carlin J F, Feltin E, Py M A and Grandjean N 2006 Appl. Phys. Lett. 89 062106
[6] Matsuoka T 1997 Appl. Phys. Lett. 71 105
[7] Koukitu A and Seki H 1996 Jpn. J. Appl. Phys. 35 L1638
[8] Kim K S, Saxler A, Kung P, Razeghi M and Lim K Y 1997 Appl.Phys. Lett. 71 800
[9] Lukitsch M J, Danylyuk Y V, Naik V M, Huang C, Auner G W, RimaiL and Naik R 2001 Appl. Phys. Lett. 79 632
[10] Onuma T, Chichibu S F, Uchinuma Y, Sota T, Yamaguchi S, KamiyamaS, Amano H and Akasaki 2003 J. Appl. Phys. 94 2449
[11] Yamaguchi S, Kariya M, Nitta S, Kato H, Takeuchi T, Wetzel C,Amano H and Akasaki I 2000 Appl. Phys. Lett. 76 876
[12] Wang K, Martin R W, Amabile D, Edwards P R, Hernandez S,Nogales E, O'Donnell K P, Lorenz K, Alves E, Matias V, Vantomme A, Wolverson D and Watson I M 2008 J. Appl. Phys. 10 3073510
[13] Oh T S, Kim J O, Jeong H, Lee Y S, NagarajanS, Lim K Y, Hong C H and Suh E K 2008 J. Phys. D: Appl.Phys. 41 095402
[14] Iliopoulos E, Adikimenakis A, Giesen C, Heuken M and Georgakilas A 2008 Appl. Phys. Lett. 92 191907
[15] O'Donnell K P, Martin R W and Middleton P G 1999 Phys. Rev.Lett. 82 237
[16] Heying B, Wu X H, Keller S, Li Y, Kapolnek D, Keller B P,DenBarrs S P and Speck J S 1996 Appl. Phys. Lett. 68 643
[17] Wu M F, Vantomme A, Hogg S, Langouche G, Vander Strich W,Jacobs K and Moerman I 2001 Nucl. Instrum. Methods Phys. Res. B 174 181
[18] Doolittle L R 1985 Nucl. Instrum. Methods Phys. Res. B {9 344
[19] Singh R, Doppalapudi D, Moustakas T D and Romano L T 1997 Appl. Phys. Lett. 70 1089
[20] El-Masty N A, Piner E L, Liu S X and Bedair S M 1998 Appl.Phys. Lett. 72 40
[21] Pereira S, Correia M R, Pereira E, O'Donnell K P, Trager-CowanC, Sweeney F and Alves E 2001 Phys. Rev. B 64 205311
[22] Lin H Y, Chena Y F, Linb T Y, Shihc C F, Liub K S and Chen N C2006 J. Cryst. Growth 290 225
[23] Lorenz K, Franco N, Alves E, Pereira S, Watson I M, Martin RW and O'Donnel K P 2008 J. Cryst. Growth 310 4058
[24] Heinke H, M?ller M O, Hommel D and Landwehr G 1994 J.Cryst. Growth 135 41
[25] Heinke H, Einfeldt S, Kuhn-Heinrich B, Plahl G, M?ller M O and Landwehr G 1995 J. Phys. D 28 A 104
[26] Cho Y H, Gainer G H, Lam J B, Song J J, Yang W and Jhe W 2000 Phys. Rev. B 61 7203
[27] Sasaki C, Naito H, Iwata M, Kudo H, Yamada Y, Taguchi T,Jyouichi T, Okagawa H, Tadatomo K and Tanaka H 2003 J. Appl.Phys. 9 3 1642
[28] Chen X X, Teng L H, Liu X D, Huang Q W, Wen J H, Lin W Z and Lai TS 2008 Acta Phys. Sin. 57 3853 (in Chinese)
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