Abstract A high-performance microring resonator in a silicon-on-insulator rib waveguide is realized by using the electron beam lithography followed by inductively coupled plasma etching. The design and the experimental realization of this device are presented in detail. In addition to improving relevant processes to minimize propagation loss, the coupling efficiency between the ring and the bus is carefully chosen to approach a critical coupling for high performance operating. We have measured a quality factor of 21,200 and an extinction ratio of 12.5dB at a resonant wavelength of 1549.32nm. Meanwhile, a low propagation loss of 0.89dB/mm in a curved waveguide with a bending radius of 40$\mu $m is demonstrated as well.
Received: 08 November 2007
Revised: 21 December 2007
Accepted manuscript online:
PACS:
42.82.Bq
(Design and performance testing of integrated-optical systems)
Fund: Project
supported by the State Key Development Program for Basic Research of
China (Grant Nos 2006CB302803 and 2007CB613405), the National High
Technology Research and Development Program of China (Grant No
2006AA03Z424) and the National Natural Science Foundation
of China (Grant No 60577044).
Cite this article:
Huang Qing-Zhong(黄庆忠), Yu Jin-Zhong(余金中), Chen Shao-Wu(陈少武), Xu Xue-Jun(徐学俊), Han Wei-Hua(韩伟华), and Fan Zhong-Chao(樊中朝) Design, fabrication and characterization of a high-performance microring resonator in silicon-on-insulator 2008 Chin. Phys. B 17 2562
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