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Chinese Physics, 2005, Vol. 14(7): 1423-1427    DOI: 10.1088/1009-1963/14/7/027
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Prev   Next  

Calculation of incident ion distribution in a rectangular hollow cathode in magnetic field

Fang Tong-Zhen (房同珍), Zhang Long (张龙), Wang Long (王龙)
Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
Abstract  Incident ion distribution inside a rectangular hollow cathode in a uniform magnetic field is studied analytically. The analysis shows that the ion distribution on one sidewall is not interfered by the other sidewall when the depth and width of the cathode are equal, and the ion distribution on the bottom surface related to the depth of the cathode and the number of ions on the bottom surface decrease monotonically from the centre to the sidewall.
Keywords:  hollow cathode discharge      incident ion distribution      magnetic field  
Received:  05 November 2004      Revised:  05 April 2005      Accepted manuscript online: 
PACS:  42.55.Ah (General laser theory)  
  42.55.Sa (Microcavity and microdisk lasers)  
  71.35.Cc (Intrinsic properties of excitons; optical absorption spectra)  
  81.15.Cd (Deposition by sputtering)  
  68.55.-a (Thin film structure and morphology)  
  78.45.+h (Stimulated emission)  

Cite this article: 

Fang Tong-Zhen (房同珍), Zhang Long (张龙), Wang Long (王龙) Calculation of incident ion distribution in a rectangular hollow cathode in magnetic field 2005 Chinese Physics 14 1423

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