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Structural stability of ultra-high temperature refractory material MoSi2 and Mo5Si3 under high pressure |
| Hao Liang(梁浩)1, Fang Peng(彭放)1, Cong Fan(樊聪)1, Qiang Zhang(张强)1, Jing Liu(刘景)2, Shi-Xue Guan(管诗雪)1 |
1 Institute of Atomic and Molecular Physics, Sichuan University, Chengdu 610065, China;
2 Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China |
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Abstract In-situ angle dispersive x-ray diffraction (ADXRD) with synchrotron radiation source is performed on an ultra-high temperature refractory of MoSi2 and Mo5Si3 by using a diamond anvil cell (DAC) at room temperature. While the pressure-induced volume reduction is almost constant, the value of the bulk modulus increases with the decrease of molybdenum content in the system. According to the Brich-Murnaghan equation, the bulk modulus 222.1 (2.1) GPa with its pressure derivative 4 of MoSi2, and the bulk modulus 308.4 (7.6) GPa with its pressure derivative 0.7 (0.1) of Mo5Si3 are obtained. The experimental data show that MoSi2 has distinct anisotropic behavior, Mo5Si3 is less anisotropic than MoSi2. The result shows that MoSi2 and Mo5Si3 have the structural stabilities under high pressure. When the pressure reaches up to 41.1 GPa, they can still maintain their body-cantered tetragonal structures.
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Received: 21 December 2016
Revised: 17 February 2017
Accepted manuscript online:
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PACS:
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31.15.ae
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(Electronic structure and bonding characteristics)
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61.05.cp
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(X-ray diffraction)
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62.20.-x
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(Mechanical properties of solids)
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| Fund: Project supported by the Joint Fund of the National Natural Science Foundation of China and the Chinese Academy of Sciences (Grant No. U1332104). |
Corresponding Authors:
Fang Peng
E-mail: pengfang@scu.edu.cn
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Cite this article:
Hao Liang(梁浩), Fang Peng(彭放), Cong Fan(樊聪), Qiang Zhang(张强), Jing Liu(刘景), Shi-Xue Guan(管诗雪) Structural stability of ultra-high temperature refractory material MoSi2 and Mo5Si3 under high pressure 2017 Chin. Phys. B 26 053101
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