Mitigation of laser damage growth in fused silica by using a non-evaporative technique

doi:10.1088/1674-1056/21/5/054216

Abstract A non-evaporative technique is used to mitigate damage sites with lateral sizes in a range from 50 μm to 400 μm and depths smaller than 100 μm. The influence of the pulse frequency of a CO₂ laser on the mitigation effect is studied. It is found that a more symmetrical and smooth mitigation crater can be obtained by increasing the laser pulse frequency form 0.1 to 20 kHz. Furthermore, the sizes of laser-affected and distorted zones decrease with the increase of the laser pulse frequency, leading to less degradation of the wave-front quality of the conditioned sample. The energy density of the CO₂ laser beam is introduced for selecting the mitigation parameters. The damage sites can be successfully mitigated by increasing the energy density in a ramped way. Finally, the laser-induced damage threshold (LIDT) of the mitigated site is tested using 355 nm laser beam with a small spot (0.23 mm²) and a large spot (3.14 mm²), separately. It is shown that the non-evaporative mitigation technique is a successful method to stop damage re-initiation since the average LIDTs of mitigated sites tested with small or large laser spots are higher than that of pristine material.

Keywords: fused silica CO₂ laser non-evaporative technique energy density

Received: 28 September 2011
Revised: 27 April 2012
Accepted manuscript online:

PACS:	42.70.Ce	(Glasses, quartz)
	61.80.-x	(Physical radiation effects, radiation damage)
	78.20.-e	(Optical properties of bulk materials and thin films)
	79.20.Eb	(Laser ablation)

Fund: Project supported by the National High Technology Research and Development Program of China (Grant No. 2008AA8040508), Foundation for Young Scholars of University of Electronic Science and Technology of China (Grant No. L08010401JX0806), the Joint Fund of the National Natural Science Foundation of China and the China Academy of Engineering Physics (Grant No. 11076008), the Fundamental Research Funds for the Central Universities of China (Grant No. ZYGX2011J043), and the Sichuan Provincial Young Scientists Foundation, China (Grant No. 2010JQ0006).

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Jiang Yong(蒋勇), Liu Chun-Ming(刘春明), Luo Cheng-Si(罗成思), Yuan Xiao-Dong(袁晓东), Xiang Xia(向霞), Wang Hai-Jun(王海军), He Shao-Bo(贺少勃), LüHai-Bin(吕海兵), Ren Wei (任玮), Zheng Wan-Guo(郑万国), and Zu Xiao-Tao(祖小涛) Mitigation of laser damage growth in fused silica by using a non-evaporative technique 2012 Chin. Phys. B 21 054216

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Mitigation of laser damage growth in fused silica by using a non-evaporative technique

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