Investigation of fabrication and hetero-epitaxy relationship of CoCrPt thin films grown on CrW underlayer
Li Song-Tian(李松田)a), Liu Xi(刘曦)a), Shi Wen-Kui(史文魁)a), Cao Jiang-Wei(曹江伟)a), Wei Fu-Lin(魏福林)a)†, and Wei Dan(韦丹)b)
aResearch Institute of Magnetic Materials, Lanzhou University, Lanzhou 730000, China; b Lab of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
Abstract This paper reports that longitudinally oriented CoCrPt thin films with Cr85W15 underlayer and CoCr intermediate layer for use of giant magnetoresistance heads were fabricated by magnetron sputtering. Without CoCr intermediate layer, CoCrPt layer deposited directly on Cr85W15 underlayer which has a dominant (200) texture exhibits unexpected (10$\bar{1}$1) texture. After introducing CoCr intermediate layer, the CoCrPt layer shifts into (11$\bar{2}$0) texture. This article studies the crystallographic hetero-epitaxy relationship between magnetic layer and underlayer in order to understand the appearance of CoCrPt (10$\bar{1}$1) texture on (200) textured Cr underlayer and the influence of CoCr intermediate layer on the inducement of CoCrPt (11$\bar{2}$0) texture. The CoCr intermediate layer plays a crucial role in controlling the microstructure and consequently the magnetic properties of the overlying magnetic layer.
Received: 10 July 2008
Revised: 11 October 2008
Accepted manuscript online:
PACS:
75.70.Ak
(Magnetic properties of monolayers and thin films)
(Magnetization curves, hysteresis, Barkhausen and related effects)
Fund: Project supported
by the National Natural Science Foundation of
China (Grant No 10174028).
Cite this article:
Li Song-Tian(李松田), Liu Xi(刘曦), Shi Wen-Kui(史文魁), Cao Jiang-Wei(曹江伟), Wei Fu-Lin(魏福林), and Wei Dan(韦丹) Investigation of fabrication and hetero-epitaxy relationship of CoCrPt thin films grown on CrW underlayer 2009 Chin. Phys. B 18 1643
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