Chin. Phys. B
Citation Search Quick Search
Chin. Phys.  2000, Vol. 9 Issue (4): 309-312    DOI: 10.1088/1009-1963/9/4/011
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Current Issue| Next Issue| Archive| Adv Search |
MICROSTRUCTURE OF SiOx:H FILMS PREPARED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
Chu Jun-haoa, Liao Xian-bob, Kong Guang-linb, Ma Zhi-xunc
a National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China; b State Key Laboratory for Surface Physics, Institute of Semiconductors, Center for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100083, China; c State Key Laboratory for Surface Physics, Institute of Semiconductors, Center for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100083, China; National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Acad