Other articles related with "back gate":
38501 Zi-Jie Zhou(周子杰), Xiang-Liang Jin(金湘亮), Yang Wang(汪洋), and Peng Dong(董鹏)
  New DDSCR structure with high holding voltage for robust ESD applications
    Chin. Phys. B   2021 Vol.30 (3): 38501- [Abstract] (425) [HTML 1 KB] [PDF 1487 KB] (75)
47305 Fan-Yu Liu(刘凡宇), Heng-Zhu Liu(刘衡竹), Bi-Wei Liu(刘必慰), Yu-Feng Guo(郭宇峰)
  An analytical model for nanowire junctionless SOI FinFETs with considering three-dimensional coupling effect
    Chin. Phys. B   2016 Vol.25 (4): 47305-047305 [Abstract] (700) [HTML 1 KB] [PDF 663 KB] (620)
88501 Lü Kai (吕凯), Chen Jing (陈静), Luo Jie-Xin (罗杰馨), He Wei-Wei (何伟伟), Huang Jian-Qiang (黄建强), Chai Zhan (柴展), Wang Xi (王曦)
  Effects of back gate bias on radio-frequency performance in partially depleted silicon-on-inslator nMOSFETs
    Chin. Phys. B   2015 Vol.24 (8): 88501-088501 [Abstract] (565) [HTML 1 KB] [PDF 291 KB] (387)
56602 Luo Jie-Xin(罗杰馨), Chen Jing(陈静), Zhou Jian-Hua(周建华), Wu Qing-Qing(伍青青), Chai Zhan(柴展), Yu Tao(余涛), and Wang Xi(王曦)
  Impact of back-gate bias on the hysteresis effect in partially depleted SOI MOSFETs
    Chin. Phys. B   2012 Vol.21 (5): 56602-056602 [Abstract] (1420) [HTML 1 KB] [PDF 268 KB] (762)
18501 Zhao Yuan-Yuan(赵远远), Qiao Ming(乔明), Wang Wei-Bin(王伟宾), Wang Meng(王猛), and Zhang Bo(张波)
  The breakdown mechanism of a high-side pLDMOS based on a thin-layer silicon-on-insulator structure
    Chin. Phys. B   2012 Vol.21 (1): 18501-018501 [Abstract] (1193) [HTML 1 KB] [PDF 410 KB] (1010)
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