Other articles related with "MIS-HEMT":
57302 Yao-Peng Zhao(赵垚澎), Chong Wang(王冲), Xue-Feng Zheng(郑雪峰), Xiao-Hua Ma(马晓华), Ang Li(李昂), Kai Liu(刘凯), Yun-Long He(何云龙), Xiao-Li Lu(陆小力) and Yue Hao(郝跃)
  Ferroelectric effect and equivalent polarization charge model of PbZr0.2Ti0.8O3 on AlGaN/GaN MIS-HEMT
    Chin. Phys. B   2021 Vol.30 (5): 57302-057302 [Abstract] (618) [HTML 1 KB] [PDF 977 KB] (164)
127101 Meihua Liu(刘美华), Zhangwei Huang(黄樟伟), Kuan-Chang Chang(张冠张), Xinnan Lin(林信南), Lei Li(李蕾), and Yufeng Jin(金玉丰)
  Characterization and optimization of AlGaN/GaN metal-insulator semiconductor heterostructure field effect transistors using supercritical CO2/H2O technology
    Chin. Phys. B   2020 Vol.29 (12): 127101- [Abstract] (396) [HTML 1 KB] [PDF 1236 KB] (53)
107201 Tao-Tao Que(阙陶陶), Ya-Wen Zhao(赵亚文), Qiu-Ling Qiu(丘秋凌), Liu-An Li(李柳暗), Liang He(何亮), Jin-Wei Zhang(张津玮), Chen-Liang Feng(冯辰亮), Zhen-Xing Liu(刘振兴), Qian-Shu Wu(吴千树), Jia Chen(陈佳), Cheng-Lang Li(黎城朗), Qi Zhang(张琦), Yun-Liang Rao(饶运良), Zhi-Yuan He(贺致远), and Yang Liu (刘扬)†
  Evaluation of stress voltage on off-state time-dependent breakdown for GaN MIS-HEMT with SiNx gate dielectric
    Chin. Phys. B   2020 Vol.29 (10): 107201- [Abstract] (646) [HTML 1 KB] [PDF 1171 KB] (120)
87304 Yao-Peng Zhao(赵垚澎), Chong Wang(王冲), Xue-Feng Zheng(郑雪峰), Xiao-Hua Ma(马晓华), Kai Liu(刘凯), Ang Li(李昂), Yun-Long He(何云龙), Yue Hao(郝跃)
  Comparative study on characteristics of Si-based AlGaN/GaN recessed MIS-HEMTs with HfO2 and Al2O3 gate insulators
    Chin. Phys. B   2020 Vol.29 (8): 87304-087304 [Abstract] (598) [HTML 0 KB] [PDF 1089 KB] (122)
67203 Ya-Wen Zhao(赵亚文), Liu-An Li(李柳暗), Tao-Tao Que(阙陶陶), Qiu-Ling Qiu(丘秋凌), Liang He(何亮), Zhen-Xing Liu(刘振兴), Jin-Wei Zhang(张津玮), Qian-Shu Wu(吴千树), Jia Chen(陈佳), Zhi-Sheng Wu(吴志盛), Yang Liu(刘扬)
  Experimental evaluation of interface states during time-dependent dielectric breakdown of GaN-based MIS-HEMTs with LPCVD-SiNx gate dielectric
    Chin. Phys. B   2020 Vol.29 (6): 67203-067203 [Abstract] (642) [HTML 1 KB] [PDF 770 KB] (154)
47304 Qing Zhu(朱青), Xiao-Hua Ma(马晓华), Yi-Lin Chen(陈怡霖), Bin Hou(侯斌), Jie-Jie Zhu(祝杰杰), Meng Zhang(张濛), Mei Wu(武玫), Ling Yang(杨凌), Yue Hao(郝跃)
  Negative bias-induced threshold voltage instability and zener/interface trapping mechanism in GaN-based MIS-HEMTs
    Chin. Phys. B   2020 Vol.29 (4): 47304-047304 [Abstract] (607) [HTML 1 KB] [PDF 753 KB] (174)
37201 Tao-Tao Que(阙陶陶), Ya-Wen Zhao(赵亚文), Liu-An Li(李柳暗), Liang He(何亮), Qiu-Ling Qiu(丘秋凌), Zhen-Xing Liu(刘振兴), Jin-Wei Zhang(张津玮), Jia Chen(陈佳), Zhi-Sheng Wu(吴志盛), Yang Liu(刘扬)
  Effect of overdrive voltage on PBTI trapping behavior in GaN MIS-HEMT with LPCVD SiNx gate dielectric
    Chin. Phys. B   2020 Vol.29 (3): 37201-037201 [Abstract] (629) [HTML 1 KB] [PDF 1180 KB] (158)
27304 Ma Xiao-Hua(马晓华), Pan Cai-Yuan(潘才渊), Yang Li-Yuan(杨丽媛), Yu Hui-You(于惠游), Yang Ling(杨凌), Quan Si(全思), Wang Hao(王昊), Zhang Jin-Cheng(张进成), and Hao Yue(郝跃)
  Characterization of Al2O3/GaN/AlGaN/GaN metal–insulator–semiconductor high electron mobility transistors with different gate recess depths
    Chin. Phys. B   2011 Vol.20 (2): 27304-027304 [Abstract] (1372) [HTML 1 KB] [PDF 662 KB] (1389)
77303 Bi Zhi-Wei(毕志伟), Feng Qian(冯倩), Hao Yue(郝跃), Wang Dang-Hui(王党会), Ma Xiao-Hua(马晓华), Zhang Jin-Cheng(张进成), Quan Si(全思), and Xu Sheng-Rui(许晟瑞)
  AlGaN/GaN MIS-HEMT using NbAlO dielectric layer grown by atomic layer deposition
    Chin. Phys. B   2010 Vol.19 (7): 77303-077303 [Abstract] (1722) [HTML 0 KB] [PDF 662 KB] (869)
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