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A new design and simulation of an aberration-corrected PEEM/ARPES/nano-ARPES instrument |
| Yuqin Yang(杨玉琴)1, Zichun Miao(苗滋春)2, Shan Qiao(乔山)3,1, Wenxin Tang(唐文新)2, Ning Dai(戴宁)4,1,†, and Weishi Wan(万唯实)5,1,‡ |
1 ShanghaiTech University, Shanghai 201210, China;
2 Suzhou AISTech Co., Ltd., Suzhou 215133, China;
3 State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;
4 Shanghai Institute of Technical Physics of the Chinese Academy of Science, Shanghai 200083, China;
5 Quantum Science Center of Guangdong-Hong Kong-Macao Greater Bay Area, Shenzhen 518045, China |
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Abstract Over the past few decades, angle-resolved photoemission spectroscopy (ARPES) has been one of the important tools to study electronic structure of crystals. In recent years, the spatial resolution of around 150 nm has been reached through tight focusing of the light spot (nano-ARPES). At present, the lower limit of the spot size of the light on the sample has been reached. Another way to further improve the spatial resolution is through using apertures to only let electrons from a small area of the sample pass. With both back-focal plane and image apertures, the size of the selected area can be as small as 20 nm. Yet, without aberration correction, the maximum opening angle at the sample for 20 nm spatial resolution is usually smaller than 3$^\circ$, making this method not suitable for nano-ARPES. As shown in this paper, a conventional aberration corrector, which corrects chromatic and third-order spherical aberrations, is not enough either. Only when the fifth-order spherical aberration is also corrected, the opening angle at the sample is large enough for nano-ARPES. In this paper, the design of a time-of-fight PEEM/ARPES/nano-ARPES instrument, which is currently under development at the Quantum Science Center of Guangdong-Hong Kong-Macao Greater Bay Area, is presented. The main point of innovation is a five-electrode electron mirror corrector, which is used to correct simultaneously chromatic, third-order and fifth-order spherical aberrations, resulting in 1 nm spatial resolution with $\sim 230$ mrad aperture angle in PEEM mode. This makes feasible the method of using apertures to improve the spatial resolution of the nano-ARPES mode. A new design of the magnetic prism array (MPA) is also presented, which preserves the rotational symmetry better than the existing designs.
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Received: 11 April 2025
Revised: 24 June 2025
Accepted manuscript online: 04 July 2025
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PACS:
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41.85.Ne
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(Electrostatic lenses, septa)
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42.15.Fr
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(Aberrations)
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79.60.-i
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(Photoemission and photoelectron spectra)
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| Fund: This work is supported by ShanghaiTech University and Quantum Science Center of Guangdong–Hong Kong–Macao Greater Bay Area, China (Grant No. SZZX2301006). |
Corresponding Authors:
Ning Dai, Weishi Wan
E-mail: ndai@mail.sitp.ac.cn;wanweishi@quantumsc.cn
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Cite this article:
Yuqin Yang(杨玉琴), Zichun Miao(苗滋春), Shan Qiao(乔山), Wenxin Tang(唐文新), Ning Dai(戴宁), and Weishi Wan(万唯实) A new design and simulation of an aberration-corrected PEEM/ARPES/nano-ARPES instrument 2025 Chin. Phys. B 34 094101
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[1] Dai Y 2024 Chin. Phys. B 33 038703
[2] Feng J and Scholl A 2007 Science of Microscopy (Hawkes P W and Spence J C H, Ed.) (New York: Springer) pp. 657-695
[3] Sala A 2020 Springer Handbook of Surface Science (Rocca M, Rahman T H and Vattuone L, Ed.) (Cham: Springer) pp. 387-425
[4] Zhang H, Pincelli T, Jozwiak C, Kondo T, Ernstorfer R, Sato T and Zhou S 2022 Nat. Rev. Methods Primers 2 54
[5] Douillard L, Charra F, Korczak Z, Bachelot R, Kostcheev S, Lerondel G, Adam P M and Royer P 2008 Nano Lett. 8 935
[6] Spektor G, Prinz E, Hartelt M, Mahro A K, Aeschlimann M and Orenstein M 2021 Sci. Adv. 7 eabg5571
[7] Davis T J, Janoschka D, Dreher P, Frank B, Meyer zu Heringdorf F J and Giessen H 2020 Science 368 eaba6415
[8] Man M K L, Margiolakis A, Deckoff-Jones S, Harada T, Wong E L, Krishna M B M, Madéo J, Winchester A, Lei S, Vajtai R, Ajayan P M and Dani K M 2017 Nat. Nanotechnol. 12 36
[9] Lv B, Qian T and Ding H 2019 Nat. Rev. Phys. 1 609
[10] Lu Q, Reddy P V S, Jeon H, Mazza A R, Brahlek M,WuW, Yang S A, Cook J, Conner C, Zhang X, Chakraborty A, Yao Y T, Tien H J, Tseng C H, Yang P Y, Lien SW, Lin H, Chiang T C, Vignale G, Li A P, Chang T R, Moore R G and Bian G 2024 Nat. Commun. 15 6001
[11] Kang T H, Kim K J, Hwang C C, Rah S, Park C Y and Kim B 2001 Nucl. Instrum. Meth. Phys. Res. Sect. A 467-468 581
[12] Reininger R, Hulbert S L, Johnson P D, Sadowski J T, Starr D E, Chubar O, Valla T and Vescovo E 2012 Rev. Sci. Instrum. 83 023102
[13] Grass M E, Karlsson P G, Aksoy F, Lundqvist M, Wannberg B, Mun B S, Hussain Z and Liu Z 2010 Rev. Sci. Instrum. 81 053106
[14] Avila J, Razado-Colambo I, Lorcy S, Lagarde B, Giorgetta J L, Polack F and Asensio M C 2013 J. Phys.: Conf. Ser. 425 192023
[15] Dudin P, Lacovig P, Fava C, Nicolini E, Bianco A, Cautero G and Barinov A 2010 J. Synchrotron Radiat. 17 445
[16] Tusche C, Krasyuk A and Kirschner J 2015 Ultramicroscopy 159 520
[17] Ji F, Shi T, Ye M, Wan W, Liu Z, Wang J, Xu T and Qiao S 2016 Phys. Rev. Lett. 116 177601
[18] Irène C, Simone L, Florian M, Hugo H, Anna T and Felix B 2021 Comptes Rendus. Physique, Recent advances in 2D material physics 22 107
[19] Orlof J 2009 Handbook of charged particle optics (London: CRC press) pp. 209-340
[20] Scherzer O 1947 Optik 2 114
[21] Rempfer G F, Desloge D M, Skoczylas W P and Griffith O H 1997 Microsc. Microanal. 3 14
[22] Henkelman R M and Ottensmeyer F P 1974 J. Phys. E: Sci. Instrum. 7 176
[23] Koshikawa T, Shimizu H, Amakawa R, Ikuta T, Yasue T and Bauer E 2005 J. Phys.: Condens. Matter 17 S1371
[24] Neßlinger A 1939 Jahrb. AEG-Forschung 6 83
[25] Hawkes P W and Kasper E 1996 Principles of Electron Optics (London: Academic Press) pp. 857-878
[26] Hibino M and Maruse S 1976 J. Electron Microsc. 25 229
[27] Hawkes P W Phil 2009 Trans. Roy. Soc. A 367 3637
[28] Preikszas D and Rose H 1997 J. Electron Microsc. 46 1
[29] Wan W, Feng F and Padmore H A 2006 Nucl. Instrum. Meth. Phys. Res. A 564 537
[30] Tromp R M, Hannon J B, Ellis AW,WanW, Berghaus A and Schaff O 2010 Ultramicroscopy 110 852
[31] Wan W, Feng J, Padmore H A and Robin D S 2004 Nucl. Instrum. Meth. Phys. Res. A 519 222
[32] Rose H 2012 Geometrical Charged-Particle Optics 2nd Ed. (Berlin: Springer-Verlag) Chap. 2, 3, and 5
[33] Wan W 2009 Proceedings of PAC09 (Vancouver, BC, Canada) pp. 778- 782
[34] Scherzer O 1936 Z. Physik. 101 593
[35] Scherzer O 1949 J. Appl. Phys. 20 20
[36] Makino K and Berz M 2006 Nucl. Instrum. Meth. Phys. Res. A 558 346
[37] Berz M 1989 Part. Accel. 24 109
[38] Enge H A 1964 Rev. Sci. Instrum. 35 278
[39] Wan W, Brouwer L, Caspi S, Prestemon S, Gerbershagen A, Schippers J M and Robin D 2015 Phys. Rev. ST Accel. Beams 18 103501 |
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