| PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
Prev
Next
|
|
|
Plasma potential measurements using an emissive probe made of oxide cathode |
| Jian-Quan Li(李建泉)1,2, Hai-Jie Ma(马海杰)1,2, and Wen-Qi Lu(陆文琪)3,† |
1 Department of Electronic and Communication Engineering, North China Electric Power University, Baoding 071003, China;
2 Hebei Key Laboratory of Power Internet of Things Technology, North China Electric Power University, Baoding 071003, China;
3 Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, School of Physics, Dalian University of Technology, Dalian 116024, China |
|
|
|
|
Abstract A novel emissive probe consisting of an oxide cathode coating is developed to achieve a low operating temperature and long service life. The properties of the novel emissive probe are investigated in detail, in comparison with a traditional tungsten emissive probe, including the operating temperature, the electron emission capability and the plasma potential measurement. Studies of the operating temperature and electron emission capability show that the tungsten emissive probe usually works at a temperature of 1800 K—2200 K while the oxide cathode emissive probe can function at about 1200 K—1400 K. In addition, plasma potential measurements using the oxide cathode emissive probe with different techniques have been accomplished in microwave electron cyclotron resonance plasmas with different discharge powers. It is found that a reliable plasma potential can be obtained using the improved inflection point method and the hot probe with zero emission limit method, while the floating point method is invalid for the oxide cathode emissive probe.
|
Received: 27 October 2023
Revised: 11 December 2023
Accepted manuscript online: 22 December 2023
|
|
PACS:
|
52.70.-m
|
(Plasma diagnostic techniques and instrumentation)
|
| |
52.70.Ds
|
(Electric and magnetic measurements)
|
| |
79.40.+z
|
(Thermionic emission)
|
|
| Fund: Project supported by the National Natural Science Foundation of China (Grant No. 11905076) and S&T Program of Hebei (Grant No. SZX2020034). |
Corresponding Authors:
Wen-Qi Lu
E-mail: luwenqi@dlut.edu.cn
|
Cite this article:
Jian-Quan Li(李建泉), Hai-Jie Ma(马海杰), and Wen-Qi Lu(陆文琪) Plasma potential measurements using an emissive probe made of oxide cathode 2024 Chin. Phys. B 33 045205
|
[1] Oksuz L and Hershkowitz N 2002 Phys. Rev. Lett. 89 145001
[2] Sheehan J P and Hershkowitz N 2011 Plasma Sources Sci. Technol. 20 063001
[3] Li J Q, Xu J, Bai Y J, Lu W Q and Wang Y N 2016 J. Vac. Sci. Technol. A 34 061304
[4] Li J Q, Lu W Q, Xu J, Gao F and Wang Y N 2018 Vacuum 155 566
[5] Li J Q, Lu W Q, Xu J and Gao F 2019 Plasma Phys. Contr. Fusion 61 105005
[6] Schrittwieser R, Ionita C, Balan P, Gstrein R, Grulke O, Windisch T, Brandt C, Klinger T, Madani R, Amarandei G and Sarma A K 2008 Rev. Sci. Instrum. 79 083508
[7] Kella V P, Mehta P, Sarma A, Ghosh J and Chattopadhyay P K 2016 Rev. Sci. Instrum. 87 043508
[8] Ye M Y and Takamura S 2000 Phys. Plasma. 7 3457
[9] Hadley C P 1953 J. Appl. Phys. 24 49
[10] Fan J K, Peng Y, Xu J Q, Xu H Y, Yang D Q, Li X P and Zhou Q 2019 Vacuum 164 278
[11] Li J Q, Li S H and Liu P 2023 Vacuum 210 111837
[12] Lafferty J M and Kingdon K H 1946 J. Appl. Phys. 17 894
[13] Horsting C W 1947 J. Appl. Phys. 18 95
[14] Fan H Y 1949 J. Appl. Phys. 20 682
[15] Schneider P 1958 J. Chem. Phys. 28 675
[16] Murray R G and Collier R J 1977 Rev. Sci. Instrum. 48 870
[17] Kemp R F and Sellen J M 1966 Rev. Sci. Instrum. 37 455
[18] Yamada H and Murphree D L 1971 Phys. Fluids 14 1120
[19] Sheehan J P, Raitses Y, Hershkowitz N, Kaganovich I and Fisch N J 2011 Phys. Plasma 18 073501
[20] Li J Q, Zhang Q H, Xing Z Y and Lu W Q 2022 J. Vac. Sci. Technol. A 40 033001
[21] Davies D E and Hopkins B J 1959 Br. J. Appl. Phys. 10 498
[22] Fang H K, Oyama K I and Chen A B 2017 Plasma Sources Sci. Technol. 26 115010
[23] Li J Q, Lu W Q, Xu J, Gao F and Wang Y N 2017 Rev. Sci. Instrum. 88 115106
[24] Li J Q, Lu W Q, Xu J, Gao F and Wang Y N 2018 Plasma Sci. Technol. 20 024002
[25] Lu W Q, Jiang X Z, Liu Y X, Yang S, Zhang Q Z, Li X S, Xu Y, Zhu A M and Wang Y N 2013 Plasma Sci. Technol. 15 511
[26] Li J Q, Xie X Y, Li S H and Zhang Q H 2022 Vacuum 200 111013
[27] LoPresto M C and Hagoort N 2011 Phys. Teach. 49 113
[28] Carlá M 2013 Am. J. Phys. 81 512
[29] Bramson M A 1968 Infrared Radiation:A Handbook for Applications, Optical Physics & Engineering, New York Plenum Press, New York, 1968, p. 536
[30] Li S H and Li J Q 2021 Vacuum 192 110496 |
| No Suggested Reading articles found! |
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
Altmetric
|
|
blogs
Facebook pages
Wikipedia page
Google+ users
|
Online attention
Altmetric calculates a score based on the online attention an article receives. Each coloured thread in the circle represents a different type of online attention. The number in the centre is the Altmetric score. Social media and mainstream news media are the main sources that calculate the score. Reference managers such as Mendeley are also tracked but do not contribute to the score. Older articles often score higher because they have had more time to get noticed. To account for this, Altmetric has included the context data for other articles of a similar age.
View more on Altmetrics
|
|
|
