Plasma diffusion and transport in a magnetic duct filter
Zhang Tao (张涛)ab, Liu Zhi-Guo (刘志国)a, Zhang Yi-Cong (张一聪)a, P. K. Chu (朱箭豪)b
a Key Laboratory of Beam Technology and Materials Modification, Ministry of Education of China, Institute of Low Energy Nuclear Physics, Beijing Radiation Center, Department of Materials Science, Beijing Normal University, Beijing 100875, China; b Department of Physics and Materials Science, City University of Hong Kong, Hong Kong, China
Abstract A cathodic arc plasma source equipped with a curved magnetic duct to filter macro-particles was used to study plasma diffusion and transport in the duct. We determine the optimal duct bias, at which the magnetic duct produces the maximum plasma output, for titanium cathodic arc plasma at 50, 100 and 150 A arc current, and we investigate the parametric effects of the arc current and guiding magnetic field on the optimal duct bias. The optimal bias decreases as the guiding magnetic field increases from 0.01 to 0.04T and is almost independent of the guiding magnetic field when the magnetic field strength ranges from 0.04 to 0.06T, the upper limit for our equipment. The optimal duct bias at 0.04T guiding magnetic field decreases with increasing arc current.
Received: 07 March 2002
Revised: 11 April 2002
Accepted manuscript online:
Fund: Project supported by the City University of Hong Kong SRG (Grant No 7001177), Hong Kong RGC CERG CityU 1032/00E (CityU designation (Grant No 9040498), the National High Technology Development Programme of China (Grant No 2001AA338020-3), the Natural Scien
Cite this article:
Zhang Tao (张涛), Liu Zhi-Guo (刘志国), Zhang Yi-Cong (张一聪), P. K. Chu (朱箭豪) Plasma diffusion and transport in a magnetic duct filter 2002 Chinese Physics 11 963
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