Abstract We investigate the relationship between the beam intensity and the four-wave mixing diffraction efficiency of longitudinal-field multiple-quantum-well(LMQW) photorefractive device grown at low temperature. The optimum beam intensity is found. We also explain the different mechanisms of the effect of beam intensity on the diffraction efficiency of the LMQW device and the transverse-field MQW device. Some advice on how to improve the diffraction efficiency is given.
Received: 02 June 2000
Revised: 23 August 2000
Accepted manuscript online:
PACS:
42.65.Hw
(Phase conjugation; photorefractive and Kerr effects)
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