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Passive on-chip isolators based on the thin-film lithium niobate platform |
| Jiacheng Liu(刘嘉成)1, Gongyu Xia(夏功榆)1, Qilin Hong(洪琦琳)1, Pingyu Zhu(朱枰谕)2, Kai-Kai Zhang(张凯凯)2, Keyu Xia(夏可宇)3, Ping Xu(徐平)2, Shiqiao Qin(秦石乔)1, and Zhihong Zhu (朱志宏)1,† |
1 College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha 410073, China;
2 Institute for Quantum Information and State Key Laboratory of High-Performance Computing, College of Computer Science and Technology, National University of Defense Technology, Changsha 410073, China;
3 College of Engineering and Applied Sciences, National Laboratory of Solid State Microstructures, and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210023, China |
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Abstract Optical isolators, the photonic analogs of electronic diodes, are essential for ensuring the unidirectional flow of light in optical systems, thereby mitigating the destabilizing effects of back reflections. Thin-film lithium niobate (TFLN), hailed as "the silicon of photonics," has emerged as a pivotal material in the realm of chip-scale nonlinear optics, propelling the demand for compact optical isolators. We report a breakthrough in the development of a fully passive, integrated optical isolator on the TFLN platform, leveraging the Kerr effect to achieve an impressive 10.3 dB of isolation with a minimal insertion loss of 1.87 dB. Further theoretical simulations have demonstrated that our design, when applied to a microring resonator with a $Q$ factor of 5$\times10^{6}$, can achieve 20 dB of isolation with an input power of merely 8 mW. This advancement underscores the immense potential of lithium niobate-based Kerr-effect isolators in propelling the integration and application of high-performance on-chip lasers, heralding a new era in integrated photonics.
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Received: 17 September 2024
Revised: 12 December 2024
Accepted manuscript online: 24 December 2024
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PACS:
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42.82.-m
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(Integrated optics)
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42.82.Et
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(Waveguides, couplers, and arrays)
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42.65.Hw
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(Phase conjugation; photorefractive and Kerr effects)
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| Fund: Project supported by the National Key Research and Development Program of China (Grant Nos. 2022YFF0712800 and 2019YFA0308700). |
Corresponding Authors:
Zhihong Zhu
E-mail: zzhwcx@163.com
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Cite this article:
Jiacheng Liu(刘嘉成), Gongyu Xia(夏功榆), Qilin Hong(洪琦琳), Pingyu Zhu(朱枰谕), Kai-Kai Zhang(张凯凯), Keyu Xia(夏可宇), Ping Xu(徐平), Shiqiao Qin(秦石乔), and Zhihong Zhu (朱志宏) Passive on-chip isolators based on the thin-film lithium niobate platform 2025 Chin. Phys. B 34 034204
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