Formation of epitaxial Tl2Ba2Ca2Cu3O10 superconducting films by dc-magnetron sputtering and triple post-annealing method

doi:10.1088/1674-1056/23/7/077401

Abstract For obtaining pure phase Tl₂Ba₂Ca₂Cu₃O₁₀ (Tl-2223) films with good superconducting properties, the growth technique is improved by dc magnetron sputtering and a triple post-annealing process. The triple post-annealing process comprises annealing twice in argon and once in oxygen at different temperatures. In the first low-temperature annealing phase in argon, Tl₂Ba₂CaCu₂O₈ (Tl-2212) is obtained to effectively minimize evaporation in the next step. With the increase of temperature in the second annealing stage in argon, the previously prepared Tl-2212 inter-phase is converted into Tl-2223 phase. An additional annealing in oxygen is also adopted to improve the properties of Tl-2223 films, each containing an optimal oxygen content value. The results of X-ray diffraction (XRD) θ -2θ scans, ω scans and rotational ø scans show that each of the Tl-2223 films has a high phase purity and an epitaxial structure. Smooth films are observed by scanning electron microscopy (SEM). The critical temperatures T_c of the films are measured to be about 120 K and the critical current densities J_c can reach 4.0 MA/cm² at 77 K at self field.

Keywords: Tl-2223 superconducting films post-annealing critical temperature critical current density

Received: 09 August 2013
Revised: 02 January 2014
Accepted manuscript online:

PACS:

74.78.-w

(Superconducting films and low-dimensional structures)

Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 51002081 and 61176119).

Corresponding Authors: Zhao Xin-Jie
E-mail: zhaoxj@nankai.edu.cn

About author: 74.78.-w

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Xie Wei (解伟), Wang Pei (王培), Ji Lu (季鲁), Ge De-Yong (葛德永), Du Jia-Nan (杜佳男), Gao Xiao-Xin (高晓昕), Liu Xin (刘欣), Song Feng-Bin (宋凤斌), Hu Lei (胡磊), Zhang Xu (张旭), He Ming (何明), Zhao Xin-Jie (赵新杰) Formation of epitaxial Tl₂Ba₂Ca₂Cu₃O₁₀ superconducting films by dc-magnetron sputtering and triple post-annealing method 2014 Chin. Phys. B 23 077401

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Formation of epitaxial Tl2Ba2Ca2Cu3O10 superconducting films by dc-magnetron sputtering and triple post-annealing method

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Formation of epitaxial Tl₂Ba₂Ca₂Cu₃O₁₀ superconducting films by dc-magnetron sputtering and triple post-annealing method