Fabrication and measurement of traceable pitch standard with a big area at trans-scale

doi:10.1088/1674-1056/23/9/090601

Abstract Atom lithography with chromium can be utilized to fabricate a pitch standard,which is directly traceable to the wavelength of the laser standing waves. The result of a calibrated commercial AFM measurement demonstrates that the pitch standard is (212.8± 0.1) nm with a peak-to-valley-height (PTVH) better than 20 nm. The measurement results show the high period accuracy of traceability with the standing laser wavelength (λ/2=212.78 nm). The Cr nano-grating covers a 1000 μm×500 μm area, with a PTVH better than 10 nm. The feature width broadening of the Cr nanostructure has been experimentally observed along the direction of the standing waves. The PTVH along the Gaussian laser direction is similar to a Gaussian distribution. Highly uniform periodic nanostructures with a big area at the millimeter scale, and the surface growth uniformity of the Cr nano-grating, show its great potential in the application of a traceable pitch standard at trans-scales.

Keywords: atom lithography nano-scale metrology standard traceability

Received: 01 April 2014
Revised: 13 May 2014
Accepted manuscript online:

PACS:	06.20.fb	(Standards and calibration)
	42.50.Wk	(Mechanical effects of light on material media, microstructures and particles)
	81.16.Nd	(Micro- and nanolithography)

Fund: Project supported by the Major Research Plan of the National Natural Science Foundation of China (Grant No. 91123022) and the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 10804084).

Corresponding Authors: Li Tong-Bao
E-mail: tbli@tongji.edu.cn

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Deng Xiao (邓晓), Li Tong-Bao (李同保), Lei Li-Hua (雷李华), Ma Yan (马艳), Ma Rui (马蕊), Weng Jun-Jing (翁浚婧), Li Yuan (李源) Fabrication and measurement of traceable pitch standard with a big area at trans-scale 2014 Chin. Phys. B 23 090601

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Fabrication and measurement of traceable pitch standard with a big area at trans-scale

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