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Chin. Phys. B, 2014, Vol. 23(7): 077401    DOI: 10.1088/1674-1056/23/7/077401
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Prev   Next  

Formation of epitaxial Tl2Ba2Ca2Cu3O10 superconducting films by dc-magnetron sputtering and triple post-annealing method

Xie Weia, Wang Peia, Ji Lua, Ge De-Yonga, Du Jia-Nana, Gao Xiao-Xina, Liu Xina, Song Feng-Binb, Hu Leia, Zhang Xua, He Minga, Zhao Xin-Jiea
a College of Electronic Information and Optical Engineering, Nankai University, Tianjin 300071, China;
b The 10th institute of Chinese Electronic Technology Corporation, Chengdu 610036, China
Abstract  For obtaining pure phase Tl2Ba2Ca2Cu3O10 (Tl-2223) films with good superconducting properties, the growth technique is improved by dc magnetron sputtering and a triple post-annealing process. The triple post-annealing process comprises annealing twice in argon and once in oxygen at different temperatures. In the first low-temperature annealing phase in argon, Tl2Ba2CaCu2O8 (Tl-2212) is obtained to effectively minimize evaporation in the next step. With the increase of temperature in the second annealing stage in argon, the previously prepared Tl-2212 inter-phase is converted into Tl-2223 phase. An additional annealing in oxygen is also adopted to improve the properties of Tl-2223 films, each containing an optimal oxygen content value. The results of X-ray diffraction (XRD) θ -2θ scans, ω scans and rotational ø scans show that each of the Tl-2223 films has a high phase purity and an epitaxial structure. Smooth films are observed by scanning electron microscopy (SEM). The critical temperatures Tc of the films are measured to be about 120 K and the critical current densities Jc can reach 4.0 MA/cm2 at 77 K at self field.
Keywords:  Tl-2223 superconducting films      post-annealing      critical temperature      critical current density  
Received:  09 August 2013      Revised:  02 January 2014      Accepted manuscript online: 
PACS:  74.78.-w (Superconducting films and low-dimensional structures)  
Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 51002081 and 61176119).
Corresponding Authors:  Zhao Xin-Jie     E-mail:  zhaoxj@nankai.edu.cn
About author:  74.78.-w

Cite this article: 

Xie Wei, Wang Pei, Ji Lu, Ge De-Yong, Du Jia-Nan, Gao Xiao-Xin, Liu Xin, Song Feng-Bin, Hu Lei, Zhang Xu, He Ming, Zhao Xin-Jie Formation of epitaxial Tl2Ba2Ca2Cu3O10 superconducting films by dc-magnetron sputtering and triple post-annealing method 2014 Chin. Phys. B 23 077401

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