Abstract The heteroepitaxial growth of multilayer Cu/Pd(100) thin film via pulse laser deposition (PLD) at room temperature is simulated by using kinetic Monte Carlo (KMC) method with realistic physical parameters. The effects of mass transport between interlayers, edge diffusion of adatoms along the islands and instantaneous deposition are considered in the simulation model. Emphasis is placed on revealing the details of multilayer Cu/Pd(100) thin film growth and estimating the Ehrlich--Schwoebel (ES) barrier. It is shown that the instantaneous deposition in the PLD growth gives rise to the layer-by-layer growth mode, persisting up to about 9 monolayers (ML) of Cu/Pd(100). The ES barriers of $0.08\pm0.01$ eV is estimated by comparing the KMC simulation results with the real scanning tunnelling microscopy (STM) measurements.
Received: 12 December 2006
Revised: 16 March 2007
Accepted manuscript online:
Fund: Project supported by the State Key
Development Program for Basic Research of China (Grant No
2006CB708612) and Natural Science Foundation for Young Scientists of
Zhejiang Province, China (Grant No RC02069).
Cite this article:
Wu Feng-Min(吴锋民), Lu Hang-Jun(陆杭军), Fang Yun-Zhang(方允樟), and Huang Shi-Hua(黄仕华) Simulation of multilayer Cu/Pd(100) heteroepitaxial growth by pulse laser deposition 2007 Chinese Physics 16 3029
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