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Initial growth and microstructure feature of Ag films prepared by very-high-frequency magnetron sputtering |
Yue Zhang(张悦)1, Chao Ye(叶超)1,2, Xiang-Ying Wang(王响英)3, Pei-Fang Yang(杨培芳)1, Jia-Min Guo(郭佳敏)1, Su Zhang(张苏)3 |
1 College of Physics, Optoelectronics and Energy, Soochow University, Suzhou 215006, China;
2 Key Laboratory of Thin Films of Jiangsu Province, Soochow University, Suzhou 215006, China;
3 Medical College, Soochow University, Suzhou 215123, China |
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Abstract The initial growth and microstructure feature of Ag films formation were investigated, which were prepared by using the very-high-frequency (VHF) (60 MHz) magnetron sputtering. Because of the moderate energy and very low flux density of ions impinging on the substrate, the evolutions of initial growth for Ag films formation were well controlled by varying the sputtering power. It was found that the initial growth of Ag films followed the island (Volmer-Weber, VW) growth mode, but before the island nucleation, the adsorption of Ag nanoparticles and the formation of Ag clusters dominated the growth. Therefore, the whole initial stages of Ag films formation included the adsorption of nanoparticles, the formation of clusters, the nucleation by the nanoparticles and clusters simultaneously, the islands formation, and the coalescence of islands.
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Received: 19 May 2017
Revised: 12 June 2017
Accepted manuscript online:
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PACS:
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52.80.Pi
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(High-frequency and RF discharges)
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81.15.Cd
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(Deposition by sputtering)
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68.55.Jk
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Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 11675118 and 11275136). |
Corresponding Authors:
Chao Ye
E-mail: cye@suda.edu.cn
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Cite this article:
Yue Zhang(张悦), Chao Ye(叶超), Xiang-Ying Wang(王响英), Pei-Fang Yang(杨培芳), Jia-Min Guo(郭佳敏), Su Zhang(张苏) Initial growth and microstructure feature of Ag films prepared by very-high-frequency magnetron sputtering 2017 Chin. Phys. B 26 095206
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[1] |
Guillén C and Herrero J 2015 Appl. Surf. Sci. 324 245
|
[2] |
Nakanishi Y, Kato K, Omoto H and Yonekura M 2013 Thin Solid Films 532 141
|
[3] |
Kumar M, Jangid T, Panchal V, Kumar P and Pathak A 2016 Nanoscale Res. Lett. 11 454
|
[4] |
Guillén C and Herrero J 2013 J. Phys. D-Appl. Phys. 46 295302
|
[5] |
Sone J, Yamagami T, Aoki Y, Nakatsuji K and Hirayama H 2014 New J. Phys. 16 095004
|
[6] |
Liu Z L, Wang M X, Xu J P, Ge J F, Le Lay G, Vogt P, Qian D, Gao C L, Liu C and Jia J F 2014 New J. Phys. 16 075006
|
[7] |
Arafune R, Lin C L, Kawahara K, Tsukahara N, Minamitani E, Kim Y, Takagi N and Kawai M 2013 Surf. Sci. 608 297
|
[8] |
Koch R 1994 J. Phys. -Condens. Mat. 6 9519
|
[9] |
Polop C, Rosiepen C, Bleikamp S, Drese R, Mayer J, Dimyati A and Michely T 2007 New J. Phys. 9 74
|
[10] |
Placidi E, Fanfoni M, Arciprete F, Patella F, Motta N and Balzarotti A 2000 Mater. Sci. Eng. B 69-70 243
|
[11] |
Bulíř J, Novotný M, Lančok J, Fekete L, Drahokoupil J and Musil J 2013 Surf. Coat. Technol. 228 S86
|
[12] |
Zhu G and Wang T L 2015 Appl. Surf. Sci. 324 831
|
[13] |
Bal J K and Hazra S 2009 Phys. Rev. B 79 155412
|
[14] |
Elofsson V, LB, Magnfält D, Münger E P and Sarakinos K 2014 J. Appl. Phys. 116 044302
|
[15] |
Guo J M, Ye C, Wang X Y, Yang P F and Zhang S 2017 Chin. Phys. B 26 065207
|
[16] |
Gu J H, Si J L, Wang J X, Feng Y Y, Gao X Y and Lu J X 2015 Chin. Phys. B 24 117703
|
[17] |
Jabbar S, Ahmad R and Chu P K 2017 Chin. Phys. B 26 010702
|
[18] |
Huang S H and Liu J 2014 Chin. Phys. B 23 058105
|
[19] |
Xiu X W and Zhao W J 2012 Chin. Phys. B 21 066802
|
[20] |
Zhao Y, Gao W, Xu B, Li Y A, Li H D, Gu G R and Yin H 2016 Chin. Phys. B 25 106801
|
[21] |
Kato K, Omoto H and Takamatsu A 2010 Vacuum 84 587
|
[22] |
Kato K, Omoto H and Takamatsu A 2012 Thin Solid Films 520 4139
|
[23] |
Kawamura M, Abe Y and Sasaki K 2006 Thin Solid Films 515 540
|
[24] |
Novotný M, Bulíř J, Pokorný P, Lančok J, Fekete L, Musil J and Čekada M 2013 Surf. Coat. Technol. 228 S466
|
[25] |
Pongbordin U, Nurak G and Chaweewan S 2016 RSC Adv. 6 7661
|
[26] |
He H J, Ye C, Wang X Y, Huang F P and Liu Y 2014 ECS J. Solid State Sci. Technol. 3 Q74
|
[27] |
Gao M W, Ye C, Wang X Y, He Y S, Guo J M and Yang P F 2016 Chin. Phys. B 25 075202
|
[28] |
Huang F P, Ye C, He H J, Liu Y, Wang X Y and Ning Z Y 2014 Plasma Sources Sci. Technol. 23 015003
|
[29] |
Ye C, He H J, Huang F P, Liu Y and Wang X Y 2014 Phys. Plasma 21 043509
|
[30] |
Ellmer K, Wendt R and Wiesemann K 2003 Int. J. Mass Spectrom. 223-224 679
|
[31] |
Seeger S, Harbauer K and Ellmer K 2009 J. Appl. Phys. 105 053305
|
[32] |
Stranak V, Drache S, Bogdanowicz R, Wulff H, Herrendorf A, Hubicka Z, Cada M, Tichy M and Hippler R 2012 Surf. Coat. Technol. 206 2801
|
[33] |
Stranak V, Wulff H, Bogdanowicz R, Drache S, Hubicka Z, Cada M, Tichy M and Hippler R 2011 Eur. Phys. J. D 64 427
|
[34] |
Palanisamy S, Yan L Q and Zhang X H 2015 Anal. Methods 7 3438
|
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