PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
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Effect of pulsed bias on properties of ZrN/TiZrN films deposited by cathodic vacuum arc |
Zhang Guo-Ping (张国平), Wang Xing-Quan (王兴权), Lü Guo-Hua (吕国华), Zhou Lan (周澜), Huang Jun (黄骏), Chen Wei (陈维), Yang Si-Ze (杨思泽) |
Institute of Physics, Chinese Academy of Science, Beijing 100080, China |
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Abstract ZrN/TiZrN multilayer are deposited by cathodic vacuum arc method with different substrate bias (from 0 to -800 V), using Ti and Zr plasma flows in residual N2 atmosphere, combined with ion bombardment of sample surfaces. The effect of pulsed bias on structure and properties of films is investigated. Microstructure of the coating is analyzed by X-ray diffraction (XRD), and scanning electron microscopy (SEM). Meanwhile, the nanohardness, Young's modulus, and scratch tests are performed. The experimental results show that the films exhibit a nanoscale multilayer structure consisting of TiZrN and ZrN phases. Solid solutions are formed for component TiZrN films. The dominant preferred orientation of TiZrN films is (111) and (220). At pulsed bias of -200 V, the nanohardness and the adhesion strength of ZrN/TiZrN multilayer reach a maximum of 38 GPa, and 78 N, respectively. The ZrN/TiZrN multilayer demonstrates an enhanced nanohardness compared with binary TiN and ZrN films deposited under equivalent conditions.
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Received: 25 June 2012
Revised: 09 August 2012
Accepted manuscript online:
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PACS:
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52.77.-j
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(Plasma applications)
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52.75.-d
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(Plasma devices)
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61.82.Bg
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(Metals and alloys)
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Fund: Project supported by the National Magnetic Confinement Fusion Science Program of China (Grant No.2009GB106004). |
Corresponding Authors:
Yang Si-Ze
E-mail: yangsz@aphy.iphy.ac.cn
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Cite this article:
Zhang Guo-Ping (张国平), Wang Xing-Quan (王兴权), Lü Guo-Hua (吕国华), Zhou Lan (周澜), Huang Jun (黄骏), Chen Wei (陈维), Yang Si-Ze (杨思泽) Effect of pulsed bias on properties of ZrN/TiZrN films deposited by cathodic vacuum arc 2013 Chin. Phys. B 22 035204
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