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Thermal analysis of intense femtosecond laser ablation of aluminum |
Hu Hao-Feng(胡浩丰)a),Ji Yang(吉扬)b),Hu Yang(胡阳)b), Ding Xiao-Yan(丁晓雁)b),Liu Xian-Wen(刘贤文)b),Guo Jing-Hui(郭静慧) c), Wang Xiao-Lei(王晓雷)a)†,and Zhai Hong-Chen(翟宏琛)a)‡ |
a Institute of Modern Optics, Key Laboratory of Optoelectronic Information Science & Technology, Ministry of Education, Nankai University, Tianjin 300071, China; b College of Precision Instruments and Optoelectronics Engineering, Tianjin University, Tianjin 300072, China; c College of Information Technical Science, Nankai University, Tianjin 300071, China |
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Abstract This paper numerically simulates the process of ablation of an aluminum target by an intense femtosecond laser with a fluence of 40 J/cm2 based on the two-temperature equation, and obtains the evolution of the free electron temperature and lattice temperature over a large temporal and depth range, for the first time. By investigating the temporal evolution curves of the free electron temperature and lattice temperature at three representative depths of 0, 100 nm and 500 nm, it reveals different characteristics and mechanisms of the free electron temperature evolution at different depths. The results show that, in the intense femtosecond laser ablation of aluminum, the material ablation is mainly induced by the thermal conduction of free electrons, instead of the direct absorption of the laser energy; in addition, the thermal conduction of free electrons and the coupling effect between electrons and lattice will induce the temperature of free electrons deep inside the target to experience a process from increase to decrease and finally to increase again.
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Received: 28 May 2010
Revised: 15 July 2010
Accepted manuscript online:
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PACS:
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42.62.-b
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(Laser applications)
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66.10.C-
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(Diffusion and thermal diffusion)
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63.20.kd
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(Phonon-electron interactions)
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Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 10904079 and 60838001), the Specialized Research Fund for the Doctoral Program of Higher Education of China (Grant No. 20090031120041), and the Natural Science Foundation of Tianjin (Grant No. 10JCYBJC01300). |
Cite this article:
Hu Hao-Feng(胡浩丰), Ji Yang(吉扬), Hu Yang(胡阳), Ding Xiao-Yan(丁晓雁), Liu Xian-Wen(刘贤文), Guo Jing-Hui(郭静慧), Wang Xiao-Lei(王晓雷), and Zhai Hong-Chen(翟宏琛) Thermal analysis of intense femtosecond laser ablation of aluminum 2011 Chin. Phys. B 20 044204
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