Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition
Gu Guang-Rui(顾广瑞)a)†, Jin Zhe(金哲)a), and Ito Toshimichib)
a Department of Physics, College of Science, Yanbian University, Yanji 133002, China; b Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan
Abstract Nano-sheet carbon films are prepared on Si wafers by means of quartz-tube microwave plasma chemical vapour deposition (MPCVD) in a gas mixture of hydrogen and methane. The structure of the fabricated films is investigated by using field emission scanning electron microscope (FESEM) and Raman spectroscopy. These nano-carbon films are possessed of good field emission (FE) characteristics with a low threshold field of 2.6 V/$\mu $m and a high current density of 12.6 mA/cm$^{2}$ at an electric field of 9 V/$\mu $m. As the FE currents tend to be saturated in a high $E$ region, no simple Fowler--Nordheim (F--N) model is applicable. A modified F--N model considering statistic effects of FE tip structures and a space-charge-limited-current (SCLC) effect is applied successfully to explaining the FE data observed at low and high electric fields, respectively.
Received: 08 July 2007
Revised: 22 October 2007
Accepted manuscript online:
Gu Guang-Rui(顾广瑞), Jin Zhe(金哲), and Ito Toshimichi Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition 2008 Chin. Phys. B 17 1467
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