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Chin. Phys. B, 2008, Vol. 17(4): 1467-1471    DOI: 10.1088/1674-1056/17/4/053
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Prev   Next  

Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition

Gu Guang-Rui(顾广瑞)a)†, Jin Zhe(金哲)a), and Ito Toshimichib)
a Department of Physics, College of Science, Yanbian University, Yanji 133002, China; b Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan
Abstract  Nano-sheet carbon films are prepared on Si wafers by means of quartz-tube microwave plasma chemical vapour deposition (MPCVD) in a gas mixture of hydrogen and methane. The structure of the fabricated films is investigated by using field emission scanning electron microscope (FESEM) and Raman spectroscopy. These nano-carbon films are possessed of good field emission (FE) characteristics with a low threshold field of 2.6 V/$\mu $m and a high current density of 12.6 mA/cm$^{2}$ at an electric field of 9 V/$\mu $m. As the FE currents tend to be saturated in a high $E$ region, no simple Fowler--Nordheim (F--N) model is applicable. A modified F--N model considering statistic effects of FE tip structures and a space-charge-limited-current (SCLC) effect is applied successfully to explaining the FE data observed at low and high electric fields, respectively.
Keywords:  field emission      carbon films      nano-sheet      microwave plasma chemical vapour deposition  
Received:  08 July 2007      Revised:  22 October 2007      Accepted manuscript online: 
PACS:  73.61.Ng (Insulators)  
  73.63.Bd (Nanocrystalline materials)  
  78.30.Hv (Other nonmetallic inorganics)  
  79.70.+q (Field emission, ionization, evaporation, and desorption)  
  81.15.Gh (Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))  

Cite this article: 

Gu Guang-Rui(顾广瑞), Jin Zhe(金哲), and Ito Toshimichi Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition 2008 Chin. Phys. B 17 1467

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