PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
Prev
Next
|
|
|
Electron characteristics and dynamics in sub-millimeter pulsed atmospheric dielectric barrier discharge |
Junlin Fang(方骏林)1, Yarong Zhang(张亚容)1, Chenzi Lu(卢陈梓)1, Lili Gu(顾莉莉)1, Shaofeng Xu(徐少锋)1, Ying Guo(郭颖)1,†, and Jianjun Shi(石建军)2,‡ |
1 College of Science, Donghua University, Shanghai 201620, China; 2 Yiwu Research Institute of Fudan University, Yiwu 322099, China |
|
|
Abstract The discharge characteristics and mechanism of sub-millimeter pulsed dielectric barrier discharge in atmospheric-pressure helium are investigated experimentally and theoretically, demonstrating that when the discharge gap distance is reduced from 1.00 mm to 0.20 mm, the discharge ignition time is reduced to approximately 40 ns and discharge intensity is enhanced in terms of the discharge optical emission intensity and density of the plasma species, (energetic electrons with energy above 8.40 eV). The simulated results show that as the discharge gap distance is further reduced to 0.10 mm, the number of energetic electrons decreases, which is attributable to the contraction of plasma bulk regime and reduction of electron density in the discharge bulk. Conversely, the proportion of energetic electrons to the total electrons in the discharge monotonically increases as the discharge gap distance is reduced from 1.00 mm to 0.10 mm. It is proposed that a gap distance of 0.12 mm is optimal to achieve a high concentration and proportion of energetic electrons in sub-millimeter pulsed atmosphere dielectric barrier discharge.
|
Received: 02 August 2023
Revised: 18 September 2023
Accepted manuscript online: 07 October 2023
|
PACS:
|
52.20.-j
|
(Elementary processes in plasmas)
|
|
52.25.-b
|
(Plasma properties)
|
|
52.40.Kh
|
(Plasma sheaths)
|
|
Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 12175036 and 11875104). |
Corresponding Authors:
Ying Guo, Jianjun Shi
E-mail: guoying@dhu.edu.cn;jianjunshi@gmail.com
|
Cite this article:
Junlin Fang(方骏林), Yarong Zhang(张亚容), Chenzi Lu(卢陈梓), Lili Gu(顾莉莉), Shaofeng Xu(徐少锋), Ying Guo(郭颖), and Jianjun Shi(石建军) Electron characteristics and dynamics in sub-millimeter pulsed atmospheric dielectric barrier discharge 2024 Chin. Phys. B 33 015201
|
[1] Borcia G, Anderson C A and Brown N M D 2003 Plasma Sources Sci. Technol. 12 3354 [2] Barnes B K, Ouro-Koura H, Derickson J, et al. 2021 Am. J. Phys. 89 372 [3] Teramoto Y, Fukumoto Y, Ono R and Oda T 2011 IEEE Trans. Plasma Sci. 39 2218 [4] Borcia G, Anderson C A and Brown N M D 2005 Plasma Sources Sci. Technol. 14 259 [5] Park G Y, Park S J, Choi M Y, Koo I G, et al. 2012 Plasma Sources Sci. Technol. 21 043001 [6] Bogaerts A, Aerts R, Snoeckx R, et al. 2012 J. Phys.:Conf. Ser. 399 012011 [7] Misra N, Bhatt S, Khonsari F A and Kumar V 2021 Plasma Process. Polym. 18 e2000215 [8] Xu S, Jirasek V and Lukes P 2023 Chemistryselect 8 e202203937 [9] Xu S, Jirasek V and Lukes P 2020 J. Phys. D:Appl. Phys. 53 275204 [10] Zhang Y R, Han Q H, Fang J L, et al. 2023 Chin. Phys. B 32 025201 [11] Tao Shao, Cheng Zhang, Ruixue Wang, et al. 2016 High Voltage Engineering 42 685 [12] Martens T, Bogaerts A and van Dijk J 2010 Appl. Phys. Lett. 96 131503 [13] Walsh J L and Kong M G 2006 Appl. Phys. Lett. 89 231503 [14] Tarasenko V F, Lomaev M I and Sorokin D A 2010 IEEE Electron Dev. Lett. [15] Williamson J M, Trump D D, Bletzinger P, et al. 2006 J. Phys. D:Appl. Phys. 39 4400 [16] Wang D H, Wang S X, Nie Z W, et al. 2022 Plasma Sources Sci. Technol. 31 045012 [17] Lodygin A N, Portsel L M, Beregulin E V, et al. 2019 J. Appl. Phys. 126 173302 [18] Sugawara H 2017 Plasma Sources Sci. Technol. 26 044002 [19] Wei L, Hu Z, Zhang Y and Yang C 2010 OZONE-Sci. Eng. 32 444 [20] Zhang Y R, Han Q H, Guo Y, et al. 2021 Acta Phys. Sin. 70 095202 (in Chinese) [21] Han Q, Guo Y, Zhang Y, Zhang J, et al. 2021 AIP Adv. 11 025021 [22] Zhang Y, Fang J, Xu S, et al. 2023 Plasma Sources Sci. Technol. 32 035003 [23] Qian Y J, Ding K, Song S T, et al. 2012 Plasma Phys. 52 289 [24] Lu X, Wu S, Chu P K, Liu D, et al. 2011 Plasma Sources Sci. Technol. 20 065009 [25] Donko Z, Derzsi A, Vass M, et al. 2018 Plasma Sources Sci. Technol. 27 104008 [26] Sakiyama Y, Graves D B and Stoffels E 2008 J. Phys. D:Appl. Phys. 41 095204 [27] Song S, Guo Y, Choe W, Zhang J, et al. 2012 Phys. Plasmas 19 123508 |
No Suggested Reading articles found! |
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
Altmetric
|
blogs
Facebook pages
Wikipedia page
Google+ users
|
Online attention
Altmetric calculates a score based on the online attention an article receives. Each coloured thread in the circle represents a different type of online attention. The number in the centre is the Altmetric score. Social media and mainstream news media are the main sources that calculate the score. Reference managers such as Mendeley are also tracked but do not contribute to the score. Older articles often score higher because they have had more time to get noticed. To account for this, Altmetric has included the context data for other articles of a similar age.
View more on Altmetrics
|
|
|