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Low temperature photoluminescence study of GaAs defect states |
Jia-Yao Huang(黄佳瑶)1, Lin Shang(尚林)1, Shu-Fang Ma(马淑芳)1, Bin Han(韩斌)1, Guo-Dong Wei(尉国栋)1, Qing-Ming Liu(刘青明)1, Xiao-Dong Hao(郝晓东)1, Heng-Sheng Shan(单恒升)1, Bing-She Xu(许并社)1,2 |
1 Institute of Atomic and Molecular Science, Shaanxi University of Science and Technology, Xi'an 710021, China; 2 Key Laboratory of Interface Science and Engineering in Advanced Materials of Ministry of Education, Taiyuan University of Technology, Taiyuan 030024, China |
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Abstract Low temperature (77 K) photoluminescence measurements have been performed on different GaAs substrates to evaluate the GaAs crystal quality. Several defect-related luminescence peaks have been observed, including 1.452 eV, 1.476 eV, 1.326 eV peaks deriving from 78 meV GaAs antisite defects, and 1.372 eV, 1.289 eV peaks resulting from As vacancy related defects. Changes in photoluminescence emission intensity and emission energy as a function of temperature and excitation power lead to the identification of the defect states. The luminescence mechanisms of the defect states were studied by photoluminescence spectroscopy and the growth quality of GaAs crystal was evaluated.
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Received: 26 August 2019
Revised: 17 November 2019
Accepted manuscript online:
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PACS:
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07.60.-j
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(Optical instruments and equipment)
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81.05.-t
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(Specific materials: fabrication, treatment, testing, and analysis)
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81.05.Ea
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(III-V semiconductors)
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Fund: Project supported by the National Natural Science Foundation of China (Grant No. 21972103), the National Key Research and Development Program of China (Grant No. 2016YFB040183), and Research and Development Program of Shanxi Province, China (Grant No. 201703D111026). |
Corresponding Authors:
Shu-Fang Ma, Bing-She Xu
E-mail: xubs@tyut.edu.cn;mashufang@sust.edu.cn
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Cite this article:
Jia-Yao Huang(黄佳瑶), Lin Shang(尚林), Shu-Fang Ma(马淑芳), Bin Han(韩斌), Guo-Dong Wei(尉国栋), Qing-Ming Liu(刘青明), Xiao-Dong Hao(郝晓东), Heng-Sheng Shan(单恒升), Bing-She Xu(许并社) Low temperature photoluminescence study of GaAs defect states 2020 Chin. Phys. B 29 010703
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[1] |
Li M F, Ni H Q, Ding Y, David B, Liang K, Ana C M and Niu Z C 2014 Chin. Phys. B 23 027803
|
[2] |
Xu J B, Zhang H Y, Fu X J, Guo T Y and Huang J 2010 Chin. Phys. B 19 037302
|
[3] |
Ali Y P, Narsale A M and Arora B M 2006 Nucl. Instr. Meth. Phys. Res. B 247 238
|
[4] |
Baeumler M, Börner F, Kretzer U, Scheffer-Czygan M, Bünger T and Wagner J 2008 J. Mater. Sci: Mater Electron. 19 165
|
[5] |
Choi H Y, Cho M Y, Yim K G, Kim M S, Lee D Y, Kim J S, Kim G S and Leem J Y 2012 Microelectron. Eng. 89 6
|
[6] |
Lavrukhin D V, Yachmenev A E, Bugaev A S, Galiev G B, Klimov E A, Khabibullin R A, Ponomarev D S and Maltsev P P 2015 Semiconductors 49 911
|
[7] |
Galiev G B, Klimov E A, Klochkov A N, Pushkarev S S and Maltsev P P 2018 Semiconductors 52 376
|
[8] |
Ky N H and Reinhart F K 1998 J. Appl. Phys. 83 718
|
[9] |
Xu H and Lindefelt U 1990 Phys. Rev. B 41 5979
|
[10] |
Wager J F 1991 J. Appl. Phys. 69 3022
|
[11] |
Yu P W 1984 Phys. Rev. B 29 2283
|
[12] |
Y P W and Reynolds D C 1982 J. Appl. Phys. 53 1263
|
[13] |
Elliott K R 1983 Appl. Phys. Lett. 42 274
|
[14] |
Chatterjee P K, Vaidyanathan K V, Durschlag M S and Streetman B G 1975 Solid State Commun. 17 1421
|
[15] |
Hwang C J 1969 Phys. Rev. 180 827
|
[16] |
Birey H and Sites J 1980 J. Appl. Phys. 51 619
|
[17] |
Bogardus E H and Bebb H B 1968 Phys. Rev. 176 993
|
[18] |
Williams E W 1968 Phys. Rev. 168 922
|
[19] |
Bugajski M, Ko K H, Lagowski J and Gatos H C 1989 J. Appl. Phys. 65 596
|
[20] |
Hetzler S R, McGill T C and Hunter A T 1984 Appl. Phys. Lett. 44 793
|
[21] |
Shanabrook B V, Moore W J and Bishop S G 1986 J. Appl. Phys. 59 2535
|
[22] |
Suezawa M and Sumino K 1994 J. Appl. Phys. 76 932
|
[23] |
Yu P W, Mitchel W C, Mier M G, Li S S and Wang W L 1982 Appl. Phys. Lett. 41 532
|
[24] |
Piazza F, Pavest L, Henini M and Johnston D 1992 Semicond. Sci. Technol. 7 1504
|
[25] |
Moore W J, Hawkins R L and Shanabrook B V 1987 Physica B+C 146 65
|
[26] |
Mihara M, Mannoh M, Shinozaki K, Naritsuka S and Ishii M 1986 Jpn. J. Appl. Phys. 25 L611
|
[27] |
Kressel H, Dunse J U, Nelson H and Hawrylo F Z 1968 J. Appl. Phys. 39 2006
|
[28] |
Kulakovskii V D, Lach E and Forchel A 1989 Phys. Rev. B 40 8087
|
[29] |
Pavesi L, Henini M and Johnston D 1995 Appl. Phys. Lett. 66 2846
|
[30] |
Borghs G, Bhattacharyya K, Deneffe K, Van Mieghem P and Mertens R 1989 J. Appl. Phys. 66 4381
|
[31] |
Mokerov V G, Fedorov Yu V, Guk A V, Galiev G B, Strakhov V A and Yaremenko N G 1998 Semiconductors 32 950
|
[32] |
Seong H and Lewis L J 1995 Phys. Rev. B 52 5675
|
[33] |
Islam A Z M T, Jung D W, Noh J P and Otsuka N 2009 J. Appl. Phys. 105 093507
|
[34] |
Hopfield J J 1959 J. Phys. Chem. Solids 10 110
|
[35] |
Ha Y K, Lee C, Kim J E and Park H Y 2000 J. Korean Phys. Soc. 36 42
|
[36] |
Thomas D G, Gershenzon M and Trumbore F A 1964 Phys. Rev. 133 A269
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