PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
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Fluid simulation of inductively coupled Ar/O2 plasmas: Comparisons with experiment |
Wang Yan-Hui (王艳会), Liu Wei (刘巍), Zhang Yu-Ru (张钰如), Wang You-Nian (王友年) |
Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China |
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Abstract In this work, a two-dimensional fluid model has been employed to study the characteristics of Ar/O2 radio frequency (RF) inductively coupled plasma discharges. The emphasis of this work has been put on the influence of the external parameters (i.e., the RF power, the pressure, and the Ar/O2 gas ratio) on the plasma properties. The numerical results show that the RF power has a significant influence on the amplitude of the plasma density rather than on the spatial distribution. However, the pressure and the Ar/O2 gas ratio affect not only the amplitude of the plasma density, but also the spatial uniformity. Finally, the comparison between the simulation results and the experimental data has been made at different gas pressures and oxygen contents, and a good agreement has been achieved.
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Received: 06 March 2015
Revised: 06 June 2015
Accepted manuscript online:
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PACS:
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52.65.-y
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(Plasma simulation)
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52.80.Pi
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(High-frequency and RF discharges)
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52.50.Qt
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(Plasma heating by radio-frequency fields; ICR, ICP, helicons)
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Fund: Project supported by the National Science and Technology Major Project of the Ministry of Science and Technology of China (Grant No. 2011ZX02403-001) and the National Natural Science Foundation of China (Grant No. 11205025). |
Corresponding Authors:
Wang You-Nian
E-mail: ynwang@dlut.edu.cn
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Cite this article:
Wang Yan-Hui (王艳会), Liu Wei (刘巍), Zhang Yu-Ru (张钰如), Wang You-Nian (王友年) Fluid simulation of inductively coupled Ar/O2 plasmas: Comparisons with experiment 2015 Chin. Phys. B 24 095203
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