| PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
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Efficiency and stability enhancement of a virtual cathode oscillator |
| Fan Yu-Wei (樊玉伟), Li Zhi-Qiang (李志强), Shu Ting (舒挺), Liu Jing (刘静) |
| College of Optoelectric Science and Engineering, National University of Defense Technology, Changsha 410073, China |
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Abstract A virtual cathode oscillator (VCO) with a resonant cavity is presented and investigated numerically and theoretically, and its efficiency and stability are enhanced. An equivalent circuit method is introduced to analyze the resonant cavity composed of anode foil and feedback annulus, and a theoretical expression for the fundamental mode frequency of the resonant cavity is given. The VCO is investigated in detail with a particle-in-cell method. We obtain the microwave frequencies from simulation, theoretical expression, and relative references, and draw three important conclusions. First, the microwave frequency is a constant when the diode voltage is changed from 588 kV to 717 kV. Second, the fluctuation of the microwave frequency is very small when the AK gap is changed from 1.2 cm to 1.6 cm. Third, the microwave frequency agrees with the theoretical result. The relative error, which is calculated according to the theoretical and simulation frequencies, is only 1.7%.
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Received: 28 July 2013
Revised: 31 December 2013
Accepted manuscript online:
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PACS:
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52.59.-f
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(Intense particle beams and radiation sources)
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52.65.Rr
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(Particle-in-cell method)
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52.27.Ny
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(Relativistic plasmas)
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| Fund: Project supported by the National Natural Science Foundation of China (Grant No. 11075210) and the Postdoctoral Science Foundation of China (Grant No. 201104761). |
Corresponding Authors:
Fan Yu-Wei
E-mail: Fyw9108212@126.com
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| About author: 52.59.-f; 52.65.Rr; 52.27.Ny |
Cite this article:
Fan Yu-Wei (樊玉伟), Li Zhi-Qiang (李志强), Shu Ting (舒挺), Liu Jing (刘静) Efficiency and stability enhancement of a virtual cathode oscillator 2014 Chin. Phys. B 23 075208
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| [1] |
Elsayed M A, Neuber A A, Dickens J C, Walter J W, Kristiansen M and Altgilbers L L 2012 Rev. Sci. Instrum. 83 024705
|
| [2] |
Singh G and Chaturvedi S 2011 Phys. Plasmas 18 063104
|
| [3] |
Wang J G, Chen Z G, Wang Y, Zhang D H, Liu C L, Li Y D, Wang H G, Qiao H L, Fu M Y and Yuan Y 2010 Phys. Plasmas 17 073107
|
| [4] |
Biswas D 2009 Phys. Plasmas 16 063104
|
| [5] |
Filatov R A, Hramov A E, Bliokh Y P, Koronovskii A A and Felsteiner J 2009 Phys. Plasmas 16 033106
|
| [6] |
Liu L, Li L M, Wen J C and Wan H 2009 Rev. Sci. Instrum. 80 023303
|
| [7] |
Li L M, Liu L, Cheng G X, Xu Q F, Wan H, Chang L and Wen J C 2009 J. Appl. Phys. 105 123301
|
| [8] |
Xiao R Z, Sun J, Chen C H, Zhang Y P and Shao H 2009 J. Appl. Phys. 106 033308
|
| [9] |
Wang J G, Zhang D H, Liu C L, Li Y D, Wang Y, Wang H G, Qiao H L and Li X Z 2009 Phys. Plasmas 16 033108
|
| [10] |
Fan Y W, Zhong H H, Li Z Q, Shu T, Zhang J D, Zhang J, Zhang X P, Yang J H and Luo L 2007 J. Appl. Phys. 102 103304
|
| [11] |
Liu J, Shu T and Li Z Q 2011 Acta Phys. Sin. 60 105202 (in Chinese)
|
| [12] |
Liu J, Shu T and Li Z Q 2010 Acta Phys. Sin. 59 1895 (in Chinese)
|
| [13] |
Liu J, Shu T and Li Z Q 2010 Acta Phys. Sin. 59 2622 (in Chinese)
|
| [14] |
Liu J, Shu T and Li Z Q 2010 Acta Phys. Sin. 59 2629 (in Chinese)
|
| [15] |
Shu T, Wang Y, Qian B L and Tan Q M 2002 Chin. Phys. Lett. 19 1646
|
| [16] |
Li Z Q, Zhong H H, Fan Y W, Shu T, Yang J H, Yuan C W, Xu L R and Zhao Y S 2008 Chin. Phys. Lett. 25 2566
|
| [17] |
Jiang W H, Shimada N, Prasad S D and Yatsui K 2004 IEEE Trans. Plasma Sci. 32 54
|
| [18] |
Jiang W H and Kristiansen M 2001 Phys. Plasmas 8 3781
|
| [19] |
Benford J, Swegle J A and Schamiloglu E 2007 High Power Microwaves (2nd edn.) (New York: Taylor Francis Group)
|
| [20] |
Benford J, Price D, Sze H and Bromley D 1987 J. Appl. Phys. 61 2098
|
| [21] |
Sullivan D J, Walsh J E and Coutsias E A 1987 High Power Microwave Sources (Boston: Artech House)
|
| [22] |
Kovalenko V F 1957 Introduction to Microwave Electronics (Beijing: Science Press) (in Chinese)
|
| [23] |
Fan Y W, Zhong H H, Shu T and Li Z Q 2008 Phys. Plasmas 15 123504
|
| [24] |
Fan Y W, Liu J, Zhong H H, Shu T and Li Z Q 2009 J. Appl. Phys. 105 083310
|
| [25] |
Woo W Y 1987 Phys. Fluids 30 239
|
| [26] |
Price D, Fittinghoff D, Benford J, Sze H and Woo W 1988 IEEE Trans. Plasma Sci. 16 177
|
| [27] |
Barker R J and Schamiloglu E 2001 High-Power Microwave Sources and Technologies (New York: IEEE Press)
|
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