中国物理B ›› 2012, Vol. 21 ›› Issue (7): 77101-077101.doi: 10.1088/1674-1056/21/7/077101

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

Novel high-voltage power lateral MOSFET with adaptive buried electrodes

章文通, 吴丽娟, 乔明, 罗小蓉, 张波, 李肇基   

  1. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China
  • 收稿日期:2011-10-24 修回日期:2011-12-08 出版日期:2012-06-01 发布日期:2012-06-01
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant No. 60906038) and the Science Technology Foundation for Young Scientist of University of Electronic Science and Technology of China (Grant No. L08010301JX0830).

Novel high-voltage power lateral MOSFET with adaptive buried electrodes

Zhang Wen-Tong(章文通)†, Wu Li-Juan(吴丽娟), Qiao Ming(乔明) Luo Xiao-Rong(罗小蓉), Zhang Bo(张波), and Li Zhao-Ji(李肇基)   

  1. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China
  • Received:2011-10-24 Revised:2011-12-08 Online:2012-06-01 Published:2012-06-01
  • Contact: Zhang Wen-Tong E-mail:wentwing@126.com
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant No. 60906038) and the Science Technology Foundation for Young Scientist of University of Electronic Science and Technology of China (Grant No. L08010301JX0830).

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摘要： A new high-voltage and low-specific on-resistance (Ron,sp) adaptive buried electrode (ABE) silicon-on-insulator (SOI) power lateral MOSFET and its analytical model of the electric fields are proposed. The MOSFET features are that the electrodes are buried in the buried oxide (BOX) layer, the negative drain voltage Vd is divided into many partial voltages and output to the electrodes in the buried oxide layer, the potentials on the electrodes change linearly from the drain to the source. Because the interface silicon layer potentials are lower than the neighboring electrode potentials, the electronic potential wells are formed above the electrode regions, and the hole potential wells are formed in the spacings of two neighbouring electrode regions. The interface hole concentration is much higher than the electron concentration through designing the buried layer electrode potentials. Based on the interface charge enhanced dielectric layer field theory, the electric field strength in the buried layer is enhanced. The vertical electric field EI and the breakdown voltage (BV) of ABE SOI are 545 V/μm and -587 V in 50 μm long drift region and 1 μm thick dielectric layer, and a low Ron,sp is obtained. Furthermore, the structure also alleviates the self-heating effect (SHE). The analytical model matches well with the simulation result.

关键词: adaptive buried electrode, interface charge, breakdown voltage, enhanced dielectric layer field

Abstract: A new high-voltage and low-specific on-resistance (Ron,sp) adaptive buried electrode (ABE) silicon-on-insulator (SOI) power lateral MOSFET and its analytical model of the electric fields are proposed. The MOSFET features are that the electrodes are buried in the buried oxide (BOX) layer, the negative drain voltage Vd is divided into many partial voltages and output to the electrodes in the buried oxide layer, the potentials on the electrodes change linearly from the drain to the source. Because the interface silicon layer potentials are lower than the neighboring electrode potentials, the electronic potential wells are formed above the electrode regions, and the hole potential wells are formed in the spacings of two neighbouring electrode regions. The interface hole concentration is much higher than the electron concentration through designing the buried layer electrode potentials. Based on the interface charge enhanced dielectric layer field theory, the electric field strength in the buried layer is enhanced. The vertical electric field EI and the breakdown voltage (BV) of ABE SOI are 545 V/μm and -587 V in 50 μm long drift region and 1 μm thick dielectric layer, and a low Ron,sp is obtained. Furthermore, the structure also alleviates the self-heating effect (SHE). The analytical model matches well with the simulation result.

Key words: adaptive buried electrode, interface charge, breakdown voltage, enhanced dielectric layer field

中图分类号:  (Theories and models of many-electron systems)

  • 71.10.-w
73.20.-r (Electron states at surfaces and interfaces) 73.40.Qv (Metal-insulator-semiconductor structures (including semiconductor-to-insulator)) 77.22.Jp (Dielectric breakdown and space-charge effects)