A nano-metallic-particles-based CMOS image sensor for DNA detection

doi:10.1088/1674-1056/21/7/076104

Abstract In this paper we report on a study of the CMOS image sensor detection of the DNA based on the self-assembled nano-metallic particles, which are selectively deposited on the surface of passive image sensor. The nano-metallic particles block the optical radiation in the visible spectrum of ordinary light source effectively. When such a technical method is applied to the DNA detection, the requirement for special UV light source in the most popular fluorescence is eliminated. The DNA detection methodology is tested on a CMOS sensor chip fabricated using a standard 0.5 μm CMOS process. It is demonstrated that the approach is highly selective to detecting even signal-base mismatched DNA target with extremely-low-concentration DNA sample down to 10 pM under ordinary light source.

Keywords: CMOS image sensor nano-metallic particles DNA detection 0.5 μm CMOS process

Received: 25 August 2011
Revised: 18 January 2012
Accepted manuscript online:

PACS:	61.82.Fk	(Semiconductors)
	64.70.kg	(Semiconductors)
	68.35.bg	(Semiconductors)

Fund: Project supported by the Key Program of the National Natural Science Foundation of China (Grant No. 61036004), the Shenzhen Science & Technology Foundation, China (Grant No. CXB201005250031A), the Fundamental Research Project of Shenzhen Science & Technology Foundation, China (Grant No. JC201005280670A), and the International Collaboration Project of Shenzhen Science & Technology Foundation, China (Grant No. ZYA2010006030006A).

Corresponding Authors: He Jin
E-mail: frankhe@pku.edu.cn

Cite this article:

He Jin(何进), Su Yan-Mei(苏艳梅), Ma Yu-Tao (马玉涛), Chen Qin(陈沁), Wang Ruo-Nan(王若楠), Ye Yun(叶韵), Ma Yong(马勇), and Liang Hai-Lang(梁海浪) A nano-metallic-particles-based CMOS image sensor for DNA detection 2012 Chin. Phys. B 21 076104

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