Thermal stability of HfO <sub>2</sub>/Si (001) films prepared by electron beam evaporation in ultrahigh vacuum using atomic oxygen

Xu Run(徐闰), Gong Wei-Ming(贡伟明), Yan Zhi-Jun(阎志军), Wang Lin-Jun(王林军), and Xia Yi-Ben(夏义本)

Chin. Phys. B . 2010, (12): 128204 -128204 . DOI: 10.1088/1674-1056/19/12/128204