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Other articles related with "boron ion implantation"：
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47305 |
Wei-Fan Wang(王伟凡), Jian-Feng Wang(王建峰), Yu-Min Zhang(张育民), Teng-Kun Li(李腾坤), Rui Xiong(熊瑞), Ke Xu(徐科) |
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Fabrication and characterization of vertical GaN Schottky barrier diodes with boron-implanted termination |
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Chin. Phys. B
2020 Vol.29 (4): 47305-047305
[Abstract]
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[HTML 1 KB]
[PDF 1329 KB]
(202)
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