Other articles related with "MOS capacitor":
117302 Zhi-Peng Yin(尹志鹏), Sheng-Sheng Wei(尉升升), Jiao Bai(白娇), Wei-Wei Xie(谢威威), Zhao-Hui Liu(刘兆慧), Fu-Wen Qin(秦福文), and De-Jun Wang(王德君)
  Ozone oxidation of 4H-SiC and flat-band voltage stability of SiC MOS capacitors
    Chin. Phys. B   2022 Vol.31 (11): 117302-117302 [Abstract] (303) [HTML 1 KB] [PDF 1551 KB] (107)
48504 Xi-Ming Chen(陈喜明), Bang-Bing Shi(石帮兵), Xuan Li(李轩), Huai-Yun Fan(范怀云), Chen-Zhan Li(李诚瞻), Xiao-Chuan Deng(邓小川), Hai-Hui Luo(罗海辉), Yu-Dong Wu(吴煜东), and Bo Zhang(张波)
  Characteristics and mechanisms of subthreshold voltage hysteresis in 4H-SiC MOSFETs
    Chin. Phys. B   2021 Vol.30 (4): 48504- [Abstract] (458) [HTML 1 KB] [PDF 790 KB] (154)
118502 Han-Han Lu(卢汉汉), Jing-Ping Xu(徐静平), Lu Liu(刘璐), Pui-To Lai(黎沛涛), Wing-Man Tang(邓咏雯)
  Equivalent distributed capacitance model of oxide traps onfrequency dispersion of C-V curve for MOS capacitors
    Chin. Phys. B   2016 Vol.25 (11): 118502-118502 [Abstract] (553) [HTML 0 KB] [PDF 1483 KB] (380)
38103 Jia Ren-Xu (贾仁需), Dong Lin-Peng (董林鹏), Niu Ying-Xi (钮应喜), Li Cheng-Zhan (李诚瞻), Song Qing-Wen (宋庆文), Tang Xiao-Yan (汤晓燕), Yang Fei (杨霏), Zhang Yu-Ming (张玉明)
  Energy-band alignment of atomic layer deposited (HfO2)x(Al2O3)1-x gate dielectrics on 4H-SiC
    Chin. Phys. B   2015 Vol.24 (3): 38103-038103 [Abstract] (763) [HTML 0 KB] [PDF 347 KB] (391)
47303 H. M. Baran, A. Tataroğlu
  Determination of interface states and their time constant for Au/SnO2/n-Si (MOS) capacitors using admittance measurements
    Chin. Phys. B   2013 Vol.22 (4): 47303-047303 [Abstract] (655) [HTML 1 KB] [PDF 884 KB] (1911)
2197 Wang Lian(王莲), Song Chong-Fu(宋崇富), Sun Jian-Qiu(孙剑秋), Hou Ying(侯莹), Li Xiao-Guang(李晓光), and Li Quan-Xin(李全新)
  Oxidation of silicon surface with atomic oxygen radical anions
    Chin. Phys. B   2008 Vol.17 (6): 2197-2203 [Abstract] (1668) [HTML 1 KB] [PDF 507 KB] (614)
529 Xu Jing-Ping(徐静平), Chen Wei-Bing(陈卫兵), Lai Pui-To(黎沛涛), Li Yan-Ping(李艳萍), and Chan Chu-Lok(陈铸略)
  Electrical properties and reliability of HfO2 gate-dielectric MOS capacitors with trichloroethylene surface pretreatment
    Chin. Phys. B   2007 Vol.16 (2): 529-532 [Abstract] (1485) [HTML 1 KB] [PDF 147 KB] (501)
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